SCHEMBL476664

SCHEMBL476664

CCOC(=O)c1ccc(C2=NC(c3ccccc3Cl)(n3c(-c4ccccc4Cl)nc(-c4ccc(C(=O)OCC)cc4)c3-c3ccc(C(=O)OCC)cc3)N=C2c2ccc(C(=O)OCC)cc2)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKT1 P31749 3/20 0.42
AKT2 P31751 3/20 0.42
PDK2 Q15119 2/20 0.42
PDE10A Q9Y233 2/20 0.41
PDE2A O00408 1/20 0.41
RARA P10276 1/20 0.40
RARB P10826 1/20 0.40
RARG P13631 1/20 0.40
F2RL3 Q96RI0 2/20 0.39
MAPT P10636 4/20 0.39
TP53 P04637 3/20 0.39
TSHR P16473 2/20 0.39
MEN1 O00255 1/20 0.39
ALDH1A1 P00352 1/20 0.39
LMNA P02545 1/20 0.39
MAPK1 P28482 1/20 0.39
KMT2A Q03164 1/20 0.39
CDC7 O00311 1/20 0.38
DBF4 Q9UBU7 1/20 0.38
KDM4E B2RXH2 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29370507 1.00 AKT1 (0.42) AKT1AKT2PDK2PDE10APDE2A
SCHEMBL1868528 0.91 MAPT (0.40) AKT1AKT2PDK2MAPTTP53
SCHEMBL2788962 0.88 TP53 (0.33) AKT1AKT2MAPTTP53KMT2A
SCHEMBL1871895 0.87 AKT1 (0.43) AKT1AKT2PDK2PDE10ARARA
SCHEMBL1867483 0.87 AKT1 (0.47) AKT1AKT2PDK2RARARARB
SCHEMBL1869201 0.86 AKT1 (0.43) AKT1AKT2PDK2PDE10ARARA
SCHEMBL1079566 0.86 MAPT (0.48) AKT1AKT2MAPTTSHRCDC7
SCHEMBL29892510 0.86 MAPT (0.48) AKT1AKT2MAPTTSHRCDC7
SCHEMBL3094971 0.86 HSD11B1 (0.36) AKT1AKT2TP53CDC7DBF4
SCHEMBL1061109 0.86 AKT1 (0.42) AKT1AKT2PDK2PDE10ARARA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 287 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7932300-B2 Energy beam curable type ink jet printing ink JSR CORPORATION (JP) 2011-04-26 US claimed
US-6120973-A PHOTOSENSITIVE COMPOSITION AND COLORS WITH POLYMERS JSR CORPORATION (JP) 2000-09-19 US claimed
EP-0902327-A2 Radiation sensitive composition JSR Corporation (JP) 1999-03-17 EP claimed
EP-0875788-A1 Radiation sensitive composition for color filters JSR Corporation (JP) 1998-11-04 EP claimed
WO-2026100662-A1 LIQUID CRYSTAL ALIGNING AGENT AND LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2026-05-15 WO disclosed
WO-2025127098-A1 PHASE DIFFERENCE FILM COMPOSITION AND SINGLE-LAYER PHASE DIFFERENCE MATERIAL 日産化学株式会社 2025-06-19 WO disclosed
US-12281235-B2 Photocurable composition, inkjet ink composition, active energy ray-curable ink composition, cured product, and electronic component JNC CORPORATION (JP) 2025-04-22 US disclosed
WO-2025047023-A1 SILICONE-CONTAINING COPOLYMER, METHOD FOR PRODUCING SAME, CURABLE RESIN COMPOSITION, AND CURED PRODUCT JNC株式会社 2025-03-06 WO disclosed
WO-2025033304-A1 METHOD FOR MANUFACTURING LIQUID CRYSTAL ALIGNMENT FILM, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2025-02-13 WO disclosed
WO-2025018147-A1 FLUORINATED ARYLSULFONATE POLYMER COMPOUND AND USE OF SAME 日産化学株式会社 2025-01-23 WO disclosed
WO-2024162343-A1 SINGLE-LAYER PHASE DIFFERENCE MATERIAL AND PHASE DIFFERENCE FILM 日産化学株式会社 2024-08-08 WO disclosed
WO-2024162344-A1 POLYMER COMPOSITION AND SINGLE-LAYER RETARDATION MATERIAL 日産化学株式会社 2024-08-08 WO disclosed
EP-1033625-A1 Radiation sensitive composition JSR Corporation (JP) 2000-09-06 EP disclosed
US-6087050-A Radiation sensitive composition and color filter JSR CORPORATION (JP) 2000-07-11 US disclosed
US-6013415-A Radiation sensitive composition JSR CORPORATION (JP) 2000-01-11 US disclosed
EP-0902327-A2 Radiation sensitive composition JSR Corporation (JP) 1999-03-17 EP disclosed
EP-0893737-A2 Radiation sensitive composition JSR Corporation (JP) 1999-01-27 EP disclosed
EP-0881541-A1 Radiation sensitive composition and color filter JSR Corporation (JP) 1998-12-02 EP disclosed
EP-0875788-A1 Radiation sensitive composition for color filters JSR Corporation (JP) 1998-11-04 EP disclosed
EP-0866367-A2 Radiation sensitive composition JSR Corporation (JP) 1998-09-23 EP disclosed