SCHEMBL1869206

SCHEMBL1869206

O=C(Oc1ccccc1)c1ccc(C2=NC(c3c(Cl)cc(Cl)cc3Cl)(n3c(-c4c(Cl)cc(Cl)cc4Cl)nc(-c4ccc(C(=O)Oc5ccccc5)cc4)c3-c3ccc(C(=O)Oc4ccccc4)cc3)N=C2c2ccc(C(=O)Oc3ccccc3)cc2)cc1

nearest known ligand 0.40

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MGAM O43451 1/20 0.35
GAA P10253 1/20 0.35
SI P14410 1/20 0.35
MGAM2 Q2M2H8 1/20 0.35
MAOA P21397 1/20 0.34
MAOB P27338 1/20 0.34
AKT1 P31749 4/20 0.33
AKT2 P31751 4/20 0.33
MAPT P10636 3/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
FABP4 P15090 1/20 0.33
FABP5 Q01469 1/20 0.33
TDP1 Q9NUW8 1/20 0.32
PRSS1 P07477 1/20 0.32
ACR P10323 1/20 0.32
TMPRSS15 P98073 1/20 0.32
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1872047 0.87 MGAM (0.40) MGAMGAASIMGAM2AKT1
SCHEMBL1061886 0.85 MAPT (0.43) GAAAKT1AKT2MAPTSMN1; SMN2
SCHEMBL476551 0.84 GAA (0.38) MGAMGAASIMGAM2AKT1
SCHEMBL1871114 0.83 AKT1 (0.33) MAOAMAOBAKT1AKT2MAPT
SCHEMBL1869270 0.83 MGAM (0.38) MGAMGAASIMGAM2MAPT
SCHEMBL2788962 0.80 TP53 (0.33) MGAMGAASIMGAM2AKT1
SCHEMBL8429516 0.77 MAPT (0.41) MAPTTDP1ALDH1A1
SCHEMBL1865541 0.77 FABP4 (0.39) MGAMGAASIMGAM2MAOA
SCHEMBL3172557 0.76 AKT1 (0.38) MGAMGAASIMGAM2AKT1
SCHEMBL1870295 0.76 FABP4 (0.35) AKT1AKT2MAPTSMN1; SMN2FABP4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1999514-B1 PHOTOSENSITIVE RESIST COMPOSITION FOR COLOR FILTERS FOR USE IN ELECTRONIC PAPER DISPLAY DEVICES CIBA HOLDING INC (CH) 2018-10-03 EP disclosed
US-8927182-B2 Photosensitive resist composition for color filters for use in electronic paper display devices BASF SE (DE) 2015-01-06 US disclosed
US-7935776-B2 having a carboxy group in its main chain and a acryloyl group in its side chain; Color filters AGI CORPORATION (TW) 2011-05-03 US disclosed
US-7785501-B2 Black resin composition for display device, and member for display device DAI NIPPON PRINTING CO., LTD. (JP) 2010-08-31 US disclosed
US-20100164911-A1 PHOTOSENSITIVE RESIST COMPOSITION FOR COLOR FILTERS FOR USE IN ELECTRONIC PAPER DISPLAY DEVICES CIBA CORPORATION 2010-07-01 US disclosed
US-20080318018-A1 Black Resin Composition for Display Device, and Member for Display Device DAI NIPPON PRINTING CO., LTD. (JP) 2008-12-25 US disclosed
EP-1999514-A1 PHOTOSENSITIVE RESIST COMPOSITION FOR COLOR FILTERS FOR USE IN ELECTRONIC PAPER DISPLAY DEVICES Ciba Holding Inc. (CH) 2008-12-10 EP disclosed
US-20080234403-A1 Radiation curable and developable polyurethane and radiation curable and developable photo resist composition containing the same AGI CORPORATION (TW) 2008-09-25 US disclosed
WO-2007113107-A1 PHOTOSENSITIVE RESIST COMPOSITION FOR COLOR FILTERS FOR USE IN ELECTRONIC PAPER DISPLAY DEVICES CIBA HOLDING INC. (CH) 2007-10-11 WO disclosed
EP-1048700-B1 Ink jet color filter resin composition, color filter production process SEIKO EPSON CORP (JP) 2006-11-02 EP disclosed
US-6120973-A PHOTOSENSITIVE COMPOSITION AND COLORS WITH POLYMERS JSR CORPORATION (JP) 2000-09-19 US disclosed
EP-1033625-A1 Radiation sensitive composition JSR Corporation (JP) 2000-09-06 EP disclosed
EP-1033626-A1 Radiation sensitive composition JSR Corporation (JP) 2000-09-06 EP disclosed
US-6087050-A Radiation sensitive composition and color filter JSR CORPORATION (JP) 2000-07-11 US disclosed
US-6013415-A Radiation sensitive composition JSR CORPORATION (JP) 2000-01-11 US disclosed
EP-0902327-A2 Radiation sensitive composition JSR Corporation (JP) 1999-03-17 EP disclosed
EP-0893737-A2 Radiation sensitive composition JSR Corporation (JP) 1999-01-27 EP disclosed
EP-0881541-A1 Radiation sensitive composition and color filter JSR Corporation (JP) 1998-12-02 EP disclosed
EP-0875788-A1 Radiation sensitive composition for color filters JSR Corporation (JP) 1998-11-04 EP disclosed
EP-0866367-A2 Radiation sensitive composition JSR Corporation (JP) 1998-09-23 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100164911-A1 PHOTOSENSITIVE RESIST COMPOSITION FOR COLOR FILTERS FOR USE IN ELECTRONIC PAPER DISPLAY DEVICES EYA2, PTPN4, PTPN5 MGAM 2500/4885GAA 2645/4885SI 4879/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.