SCHEMBL18747660

SCHEMBL18747660

Cc1cc(C)c(NCCS(=O)(=O)O)c(C)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FFAR4 Q5NUL3 7/20 0.41
RAPGEF4 Q8WZA2 2/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
MMP1 P03956 1/20 0.40
MMP2 P08253 1/20 0.40
MMP9 P14780 1/20 0.40
MMP8 P22894 1/20 0.40
MMP13 P45452 1/20 0.40
FABP4 P15090 1/20 0.40
LMNA P02545 1/20 0.40
ALDH1A1 P00352 1/20 0.39
MEN1 O00255 1/20 0.37
POLB P06746 1/20 0.37
KMT2A Q03164 1/20 0.37
TSHR P16473 1/20 0.37
METAP2 P50579 1/20 0.36
GABRG2 P18507 1/20 0.36
GABRB3 P28472 1/20 0.36
GABRA3 P34903 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL574724 0.89 CDK1 (0.35) FFAR4CA1CA2FABP4ALDH1A1
SCHEMBL574611 0.82 ALDH1A1 (0.44) ALDH1A1TSHR
SCHEMBL28268712 0.79 FABP4 (0.34) FFAR4CA1CA2MMP1MMP2
SCHEMBL574466 0.79 ALDH1A1 (0.33) CA1CA2FABP4ALDH1A1
SCHEMBL574593 0.79 ALDH1A1 (0.33) CA1CA2FABP4ALDH1A1
SCHEMBL18747679 0.77 SMN1; SMN2 (0.49) RAPGEF4ALDH1A1MEN1KMT2AHPGD
SCHEMBL2756366 0.77 RAPGEF4 (0.57) FFAR4RAPGEF4LMNAALDH1A1
SCHEMBL28263071 0.77 FABP4 (0.35) FFAR4RAPGEF4CA1CA2MMP1
SCHEMBL2335362 0.76 RAPGEF4 (0.50) RAPGEF4LMNAALDH1A1KMT2A
SCHEMBL17703608 0.75 FABP4 (0.63) CA1CA2MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10509314-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-12-17 US disclosed
US-20170108774-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-20 US disclosed
US-20170108774-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10509314-B2 Resist composition and patterning process SRMS, SLC11A2, PCNA FFAR4 3077/4885RAPGEF4 3740/4885CA1 2190/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.