SCHEMBL18775985

SCHEMBL18775985

Cc1ccc(S(=O)(=O)OCCS(=O)(=O)O)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 4/20 0.46
▸ STAT3 P40763 2/20 0.46
▸ CYP3A4 P08684 1/20 0.46
▸ CYP2C9 P11712 1/20 0.46
▸ CYP2C19 P33261 1/20 0.46
▸ CYP2D6 P10635 1/20 0.44
▸ CA1 P00915 3/20 0.44
▸ CA12 O43570 2/20 0.44
▸ CA9 Q16790 2/20 0.44
▸ GAA P10253 2/20 0.43
▸ KMT2A Q03164 3/20 0.41
▸ CA2 P00918 2/20 0.41
▸ MMP1 P03956 1/20 0.41
▸ MMP2 P08253 1/20 0.41
▸ MMP9 P14780 1/20 0.41
▸ MMP8 P22894 1/20 0.41
▸ MMP13 P45452 1/20 0.41
▸ CA3 P07451 1/20 0.41
▸ CA6 P23280 1/20 0.41
▸ CA5A P35218 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9025009 0.87 STAT3 (0.47) ALDH1A1STAT3CYP3A4CYP2C9CYP2C19
SCHEMBL241884 0.86 CA1 (0.52) ALDH1A1STAT3CYP3A4CYP2C9CYP2C19
SCHEMBL1556981 0.85 ALDH1A1 (0.46) ALDH1A1STAT3CYP3A4CYP2C9CYP2C19
SCHEMBL1258986 0.83 STAT3 (0.47) ALDH1A1STAT3CYP3A4CYP2C9CYP2C19
Ethylene Glycol SCHEMBL1936214 0.83 CA1 (0.48) ALDH1A1STAT3CYP3A4CYP2C9CYP2C19
Ethylene SCHEMBL4379131 0.82 CA1 (0.50) ALDH1A1STAT3CYP3A4CYP2C9CYP2C19
Ethylene SCHEMBL3466431 0.82 CA1 (0.50) ALDH1A1STAT3CYP3A4CYP2C9CYP2C19
SCHEMBL890725 0.82 ALDH1A1 (0.50) ALDH1A1STAT3CYP3A4CYP2C9CYP2C19
SCHEMBL483847 0.82 ALDH1A1 (0.50) ALDH1A1STAT3CYP3A4CYP2C9CYP2C19
Water SCHEMBL7788572 0.82 CA1 (0.50) ALDH1A1STAT3CYP3A4CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11366386-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-21 — — US disclosed
US-11231649-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-01-25 — — US disclosed
US-10844257-B2 Adhesive composition, bio-electrode, and method for manufacturing a bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-11-24 — — US disclosed
US-20190354017-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-11-21 — — US disclosed
US-20190354016-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-11-21 — — US disclosed
US-20190258160-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-08-22 — — US disclosed
US-20180086948-A1 ADHESIVE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING A BIO-ELECTRODE, AND SALT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-29 — — US disclosed
US-20180072930-A1 ADHESIVE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING A BIO-ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-15 — — US disclosed
US-20180072930-A1 ADHESIVE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING A BIO-ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-15 — — US disclosed
US-20170115566-A1 RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-27 — — US disclosed
US-20170115566-A1 RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-27 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170115566-A1 RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS CASR, LIFR, LBR ALDH1A1 4520/4885STAT3 3554/4885CYP3A4 4680/4885
US-11366386-B2 Patterning process FEM1B, EGLN1, TET1 ALDH1A1 960/4885STAT3 4437/4885CYP3A4 1866/4885
US-20180086948-A1 ADHESIVE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING A BIO-ELECTRODE, AND SALT SLC9A1, FN1, EPCAM ALDH1A1 749/4885STAT3 1508/4885CYP3A4 4022/4885
US-20190354017-A1 PATTERNING PROCESS FEM1B, EGLN1, TET1 ALDH1A1 960/4885STAT3 4437/4885CYP3A4 1866/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

Send feedback