SCHEMBL18802768

SCHEMBL18802768

CC(C)(O)c1cc(C(C)(C)O)c(C(C)(C)O)cc1O

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALOX15 P16050 6/20 0.57
▸ ALDH1A1 P00352 6/20 0.57
▸ SMN1; SMN2 Q16637 3/20 0.57
▸ CYP1A2 P05177 2/20 0.57
▸ MAPT P10636 2/20 0.57
▸ KDM4E B2RXH2 1/20 0.57
▸ ATP2A2 P16615 1/20 0.57
▸ ATP2A3 Q93084 1/20 0.57
▸ LMNA P02545 2/20 0.41
▸ TP53 P04637 2/20 0.41
▸ CYP3A4 P08684 2/20 0.41
▸ HPGD P15428 2/20 0.41
▸ TYR P14679 2/20 0.36
▸ HSD17B10 Q99714 2/20 0.36
▸ CYP2C9 P11712 2/20 0.36
▸ NR1I2 O75469 1/20 0.36
▸ MIF P14174 1/20 0.36
▸ HTT P42858 1/20 0.36
▸ NFE2L2 Q16236 1/20 0.36
▸ TDP1 Q9NUW8 3/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18802760 0.85 ALDH1A1 (0.40) ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT
SCHEMBL7647492 0.74 ALOX15 (0.88) ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT
SCHEMBL28727048 0.74 ALDH1A1 (0.41) ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT
SCHEMBL38604 0.73 ALOX15 (1.00) ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT
SCHEMBL18802740 0.72 PGK1 (0.37) ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT
SCHEMBL7949470 0.72 ALDH1A1 (0.52) ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT
SCHEMBL14283783 0.72 ALDH1A1 (0.71) ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT
SCHEMBL67854 0.71 ALOX15 (0.82) ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT
Methane SCHEMBL28686923 0.71 ALOX15 (0.94) ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT
SCHEMBL31310910 0.71 ALOX15 (0.94) ALOX15ALDH1A1SMN1; SMN2CYP1A2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170121437-A1 PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND MASK BLANK FUJIFILM CORPORATION (JP) 2017-05-04 — — US disclosed
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