Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RXRA | P19793 | 2/20 | 0.47 |
| ▸ | RXRB | P28702 | 2/20 | 0.47 |
| ▸ | MAOB | P27338 | 4/20 | 0.45 |
| ▸ | APP | P05067 | 2/20 | 0.41 |
| ▸ | NR4A2 | P43354 | 2/20 | 0.41 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.40 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.40 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.39 |
| ▸ | SOD1 | P00441 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 3/20 | 0.38 |
| ▸ | RAB9A | P51151 | 3/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18802918 | 0.93 | APP (0.46) | RXRARXRBMAOBAPPNR4A2 | |
| SCHEMBL5164170 | 0.85 | MEN1 (0.51) | MAOBNR4A2NR4A1NR4A3RAB9A | |
| SCHEMBL24533738 | 0.84 | MAOB (0.38) | RXRARXRBMAOBAPPNR4A2 | |
| SCHEMBL24533723 | 0.80 | APP (0.61) | RXRARXRBMAOBAPPNR4A2 | |
| SCHEMBL9270383 | 0.76 | NQO1 (0.42) | RXRARXRBMAPT | |
| SCHEMBL13761594 | 0.75 | NR4A2 (0.56) | MAOBAPPNR4A2NR4A1NR4A3 | |
| SCHEMBL128572 | 0.75 | LPL (0.46) | KMT2AMEN1SMN1; SMN2 | |
| SCHEMBL24533757 | 0.75 | APP (0.50) | RXRARXRBMAOBAPPNR4A2 | |
| SCHEMBL9342676 | 0.75 | TUBB1 (0.61) | RXRARXRBMAOBAPPNR4A2 | |
| SCHEMBL14579981 | 0.74 | APP (0.57) | RXRARXRBMAOBAPPNR4A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170121437-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND MASK BLANK | FUJIFILM CORPORATION (JP) | 2017-05-04 | — | — | US | disclosed |