SCHEMBL24533738

SCHEMBL24533738

CC(C)(O)c1cc(OCc2cc(COc3cc(C(C)(C)O)cc(C(C)(C)O)c3)cc(COc3cc(C(C)(C)O)cc(C(C)(C)O)c3)c2)cc(C(C)(C)O)c1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAOB P27338 3/20 0.38
▸ PRSS1 P07477 1/20 0.38
▸ PRSS2 P07478 1/20 0.38
▸ PRSS3 P35030 1/20 0.38
▸ PTPRC P08575 1/20 0.37
▸ PTPRF P10586 1/20 0.37
▸ PTPN1 P18031 1/20 0.37
▸ CYP4F2 P78329 1/20 0.36
▸ CYP4A11 Q02928 1/20 0.36
▸ APP P05067 1/20 0.36
▸ NR4A2 P43354 2/20 0.36
▸ RXRA P19793 1/20 0.36
▸ RXRB P28702 1/20 0.36
▸ NR4A1 P22736 1/20 0.36
▸ NR4A3 Q92570 1/20 0.36
▸ F2 P00734 1/20 0.35
▸ PKM P14618 1/20 0.35
▸ PDK1 Q15118 1/20 0.34
▸ PDK2 Q15119 1/20 0.34
▸ PDK3 Q15120 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18802918 0.90 APP (0.46) MAOBPTPRCPTPN1APPNR4A2
SCHEMBL26575146 0.87 RXRA (0.35) MAOBPRSS1PRSS2PRSS3PTPRC
SCHEMBL5164170 0.85 MEN1 (0.51) MAOBCYP4F2CYP4A11NR4A2NR4A1
SCHEMBL18811515 0.84 RXRA (0.47) MAOBAPPNR4A2RXRARXRB
SCHEMBL24533757 0.82 APP (0.50) MAOBPRSS1PRSS2PRSS3PTPRC
SCHEMBL9270383 0.79 NQO1 (0.42) PRSS1PRSS2PRSS3RXRARXRB
SCHEMBL24533749 0.78 HRH3 (0.32) —
SCHEMBL24533730 0.76 HRH3 (0.37) MEN1KMT2A
SCHEMBL24564761 0.74 HRH3 (0.30) —
SCHEMBL24533725 0.74 F2 (0.53) MAOBPTPRCPTPN1CYP4F2CYP4A11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4258056-A2 ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-11 — — EP disclosed
EP-4019489-A1 ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-29 — — EP disclosed
US-20220197140-A1 ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-23 — — US disclosed
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