Ether

Ether

SCHEMBL1883015

CCC(=O)OCCOC(=O)CC.CCOCC.OCCO

nearest known ligand 0.48

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.48
ALDH1A1 P00352 6/20 0.46
TSHR P16473 1/20 0.46
THRB P10828 1/20 0.41
DGKA P23743 1/20 0.39
GAA P10253 2/20 0.38
MGAM O43451 1/20 0.37
SI P14410 1/20 0.37
MGAM2 Q2M2H8 1/20 0.37
SOAT1 P35610 1/20 0.37
CYP4F2 P78329 2/20 0.36
CYP4A11 Q02928 2/20 0.36
HTT P42858 1/20 0.36
CYP1A2 P05177 1/20 0.35
HPGD P15428 1/20 0.35
CYP2C19 P33261 1/20 0.35
BLM P54132 1/20 0.35
WRN Q14191 1/20 0.35
HIF1A Q16665 1/20 0.35
KDM4E B2RXH2 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ether SCHEMBL5386325 0.96 NAAA (0.45) NAAAALDH1A1TSHRTHRBDGKA
Ether SCHEMBL5414917 0.91 NAAA (0.50) NAAAALDH1A1TSHRTHRBDGKA
Ether SCHEMBL1800147 0.91 ALDH1A1 (0.50) NAAAALDH1A1TSHRTHRBDGKA
Ethylene Glycol SCHEMBL3915028 0.91 NAAA (0.56) NAAAALDH1A1TSHRDGKAGAA
Ether SCHEMBL11758475 0.90 ALDH1A1 (0.50) NAAAALDH1A1TSHRTHRBDGKA
Ether SCHEMBL181381 0.88 NAAA (0.62) NAAAALDH1A1TSHRDGKAHTT
Ether SCHEMBL2254830 0.86 NAAA (0.71) NAAATSHRTHRBDGKAHTT
SCHEMBL106760 0.86 ALDH1A1 (0.62) NAAAALDH1A1TSHRTHRBDGKA
SCHEMBL181390 0.84 ALDH1A1 (0.60) NAAAALDH1A1TSHRTHRBDGKA
SCHEMBL5411907 0.84 ALDH1A1 (0.60) NAAAALDH1A1TSHRTHRBDGKA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 150 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114409342-B Preparation method of ceramic tile glue 清远楼邦建材科技有限公司 2022-09-16 CN claimed
CN-114556216-A Positive photosensitive resin composition and display element using the same 株式会社东进世美肯 2022-05-27 CN claimed
CN-114409342-A Preparation method of ceramic tile glue 清远楼邦建材科技有限公司 2022-04-29 CN claimed
CN-108192488-B Solvent-based bi-component high-smoothness varnish composition, preparation method and application 广州立邦涂料有限公司 2021-03-02 CN claimed
CN-110627597-B Aviation color smoke agent and preparation method thereof 颜谷科技发展(天津)有限公司 2020-08-07 CN claimed
CN-106916503-B Single-component varnish composition, preparation method and application thereof 廊坊立邦涂料有限公司 2020-03-17 CN claimed
CN-106928410-B Organic silicon modified acrylic resin with high solid content and low viscosity, preparation method and application 立邦涂料(中国)有限公司 2020-02-07 CN claimed
CN-110627597-A Aviation color smoke agent and preparation method thereof 颜谷科技发展(天津)有限公司 2019-12-31 CN claimed
US-8492459-B2 Ink composition and method of forming a pattern using the same LG DISPLAY CO., LTD. (KR) 2013-07-23 US claimed
US-20090176936-A1 Ink composition and method of forming a pattern using the same LG DISPLAY CO., LTD. (KR) 2009-07-09 US claimed
CN-114556216-B Positive photosensitive resin composition and display element using same 株式会社东进世美肯 2025-04-25 CN disclosed
US-12252587-B2 Curable resin composition, thin film, and color conversion panel and display device including thin film SAMSUNG SDI CO., LTD. (KR) 2025-03-18 US disclosed
CN-108803240-B Photosensitive resin composition 株式会社东进世美肯 2024-12-03 CN disclosed
CN-113169248-B Method for manufacturing semiconductor element and method for manufacturing solar cell 东丽株式会社 2024-10-01 CN disclosed
US-20240142874-A1 NON-CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2024-05-02 US disclosed
US-20060047034-A1 Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film HITACHI CHEMICAL CO., LTD. (JP) 2006-03-02 US disclosed
US-20050131091-A1 Process for producing synthetic resin foam, blowing agent and premix DAIKIN INDUSTRIES, LTD. (JP) 2005-06-16 US disclosed
US-20050043422-A1 Process for producing synthetic resin foam DAIKIN INDUSTRIES, LTD. (JP) 2005-02-24 US disclosed
EP-1498439-A1 PROCESS FOR PRODUCING SYNTHETIC RESIN FOAM, BLOWING AGENT, AND PREMIX Daikin Industries, Ltd. (JP) 2005-01-19 EP disclosed
EP-1457506-A1 PROCESS FOR PRODUCING SYNTHETIC RESIN FOAM Daikin Industries, Ltd. (JP) 2004-09-15 EP disclosed