Ether

Ether

SCHEMBL5386325

CCC(=O)OCCOC(=O)CC.CCOCC.COC.OCCO

nearest known ligand 0.45

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.45
ALDH1A1 P00352 6/20 0.43
TSHR P16473 1/20 0.43
THRB P10828 1/20 0.38
DGKA P23743 1/20 0.36
GAA P10253 2/20 0.36
MGAM O43451 1/20 0.34
SI P14410 1/20 0.34
MGAM2 Q2M2H8 1/20 0.34
SOAT1 P35610 1/20 0.34
CYP4F2 P78329 2/20 0.34
CYP4A11 Q02928 2/20 0.34
HTT P42858 1/20 0.34
KDM4E B2RXH2 1/20 0.33
CYP1A2 P05177 1/20 0.33
HPGD P15428 1/20 0.33
CYP2C19 P33261 1/20 0.33
BLM P54132 1/20 0.33
WRN Q14191 1/20 0.33
HIF1A Q16665 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ether SCHEMBL1883015 0.96 NAAA (0.48) NAAAALDH1A1TSHRTHRBDGKA
Ether SCHEMBL5414917 0.88 NAAA (0.50) NAAAALDH1A1TSHRTHRBDGKA
Ether SCHEMBL1800147 0.87 ALDH1A1 (0.50) NAAAALDH1A1TSHRTHRBDGKA
Ethylene Glycol SCHEMBL3915028 0.87 NAAA (0.56) NAAAALDH1A1TSHRDGKAGAA
Ether SCHEMBL11758475 0.86 ALDH1A1 (0.50) NAAAALDH1A1TSHRTHRBDGKA
Ether SCHEMBL181381 0.84 NAAA (0.62) NAAAALDH1A1TSHRDGKAHTT
Methoxymethane SCHEMBL19666666 0.83 MEN1 (0.46) NAAAALDH1A1TSHRTHRBDGKA
Ether SCHEMBL2254830 0.82 NAAA (0.71) NAAATSHRTHRBDGKAHTT
Methoxymethane SCHEMBL19666658 0.82 NAAA (0.52) NAAAALDH1A1TSHRDGKAGAA
SCHEMBL106760 0.82 ALDH1A1 (0.62) NAAAALDH1A1TSHRTHRBDGKA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7205030-B2 Method for forming porous film SANYO ELECTRIC CO., LTD. (JP) 2007-04-17 US disclosed
US-20040213911-A1 Method for forming porous film SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. (JP) 2004-10-28 US disclosed