⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18898101 | 0.85 | — | — | |
| SCHEMBL19718945 | 0.78 | ALDH1A1 (0.43) | — | |
| SCHEMBL18400941 | 0.78 | ALDH1A1 (0.43) | — | |
| SCHEMBL23963257 | 0.77 | TSHR (0.33) | — | |
| SCHEMBL19125903 | 0.76 | DPP4 (0.33) | — | |
| SCHEMBL22516937 | 0.75 | — | — | |
| SCHEMBL19215159 | 0.75 | — | — | |
| SCHEMBL24526587 | 0.74 | DPP4 (0.32) | — | |
| SCHEMBL18785986 | 0.71 | SLC18A2 (0.30) | — | |
| SCHEMBL13073269 | 0.70 | PRKCA (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9897914-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-20 | — | — | US | disclosed |
| US-20170184963-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170130071-A1 | CONDUCTIVE MATERIAL AND SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-11 | — | — | US | disclosed |