Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | OPRM1 | P35372 | 7/20 | 0.36 |
| ▸ | OPRK1 | P41145 | 6/20 | 0.36 |
| ▸ | OPRL1 | P41146 | 6/20 | 0.36 |
| ▸ | OPRD1 | P41143 | 4/20 | 0.36 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.34 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.34 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.34 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.34 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | SYK | P43405 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18905270 | 0.98 | OPRM1 (0.36) | OPRM1OPRK1OPRL1OPRD1CYP4F2 | |
| SCHEMBL18905296 | 0.77 | SLC6A4 (0.37) | SLC6A2SLC6A4KMT2A | |
| SCHEMBL2718795 | 0.76 | CYP3A4 (0.42) | OPRM1OPRK1OPRL1OPRD1ALDH1A1 | |
| SCHEMBL27681431 | 0.76 | SLC6A4 (0.54) | OPRM1OPRK1OPRL1OPRD1SLC6A2 | |
| SCHEMBL27266340 | 0.76 | OPRM1 (0.56) | OPRM1OPRK1OPRL1OPRD1SLC6A2 | |
| SCHEMBL17982783 | 0.76 | OPRL1 (0.56) | OPRM1OPRK1OPRL1OPRD1SLC6A2 | |
| SCHEMBL1598944 | 0.76 | OPRL1 (0.36) | OPRM1OPRK1OPRL1OPRD1CYP4F2 | |
| SCHEMBL3946783 | 0.76 | OPRM1 (0.47) | OPRM1OPRK1OPRD1SLC6A2SLC6A4 | |
| SCHEMBL7136098 | 0.76 | ALDH1A1 (0.42) | OPRM1OPRK1OPRL1OPRD1SLC6A2 | |
| SCHEMBL18905264 | 0.76 | SLC6A4 (0.39) | SLC6A2SLC6A4KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170154766-A1 | SILICON-CONTAINING CONDENSATE, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-01 | — | — | US | disclosed |