SCHEMBL18906496

SCHEMBL18906496

O=COC1=C(C(=O)O)C2C3CC(C(CC(=O)O)C3C(=O)O)C12

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18912876 0.84 HSD11B1 (0.37) —
SCHEMBL18912877 0.74 HTT (0.33) —
SCHEMBL7857014 0.71 HSD11B1 (0.34) —
SCHEMBL18906498 0.70 HTT (0.32) —
SCHEMBL16522346 0.69 HSD11B1 (0.35) —
SCHEMBL353233 0.69 HSD11B1 (0.43) —
SCHEMBL16249890 0.67 HSD11B1 (0.42) —
SCHEMBL16351616 0.67 HSD11B1 (0.33) —
SCHEMBL16351613 0.67 HSD11B1 (0.33) —
SCHEMBL16249613 0.65 HSD11B1 (0.39) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170153549-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING ORGANIC GROUP HAVING ALIPHATIC POLYCYCLIC STRUCTURE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-06-01 — — US disclosed
Send feedback