Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 3/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 2/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18906498 | 0.92 | HTT (0.32) | HTTLMNAALDH1A1TP53SMN1; SMN2 | |
| SCHEMBL3020896 | 0.84 | ALDH1A1 (0.39) | HTTLMNAALDH1A1KDM4ETP53 | |
| SCHEMBL13216610 | 0.84 | ALDH1A1 (0.39) | HTTLMNAALDH1A1KDM4ETP53 | |
| SCHEMBL18912876 | 0.82 | HSD11B1 (0.37) | HTTLMNAHSD11B1POLBTDP1 | |
| SCHEMBL7857014 | 0.75 | HSD11B1 (0.34) | HTTLMNAHSD11B1POLBTDP1 | |
| SCHEMBL18906496 | 0.74 | — | — | |
| SCHEMBL353233 | 0.73 | HSD11B1 (0.43) | LMNAALDH1A1HSD11B1SMN1; SMN2POLB | |
| SCHEMBL16249890 | 0.71 | HSD11B1 (0.42) | LMNAALDH1A1HSD11B1SMN1; SMN2POLB | |
| SCHEMBL16249613 | 0.68 | HSD11B1 (0.39) | LMNAALDH1A1HSD11B1KDM4EPOLB | |
| SCHEMBL16522346 | 0.67 | HSD11B1 (0.35) | HSD11B1POLBTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170153549-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING ORGANIC GROUP HAVING ALIPHATIC POLYCYCLIC STRUCTURE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-06-01 | — | — | US | disclosed |