Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.54 |
| ▸ | IDO1 | P14902 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 2/20 | 0.33 |
| ▸ | CA2 | P00918 | 2/20 | 0.33 |
| ▸ | NPY5R | Q15761 | 1/20 | 0.31 |
| ▸ | CA12 | O43570 | 1/20 | 0.31 |
| ▸ | CA7 | P43166 | 1/20 | 0.31 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28369246 | 0.82 | CA2 (0.40) | EPHX1CA1CA2 | |
| SCHEMBL28476757 | 0.82 | CA2 (0.40) | EPHX1CA1CA2 | |
| SCHEMBL12134709 | 0.82 | EPHX1 (0.34) | EPHX1 | |
| SCHEMBL3099041 | 0.79 | POLB (0.37) | CA1CA2CA12CA7CA14 | |
| SCHEMBL16566788 | 0.75 | RELA (0.36) | CA1CA2CA12CA7CA14 | |
| SCHEMBL47312 | 0.74 | EPHX1 (0.84) | EPHX1MEN1HTTKMT2ACA1 | |
| SCHEMBL18940694 | 0.74 | — | — | |
| SCHEMBL9105305 | 0.73 | — | — | |
| SCHEMBL6445621 | 0.73 | EPHX1 (0.32) | EPHX1 | |
| SCHEMBL3104136 | 0.73 | CA12 (0.31) | CA1CA2CA12CA7CA14 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106662820-B | Composition for forming silicon-containing resist underlayer film having halosulfonylalkyl group | 日产化学工业株式会社 | 2021-06-22 | — | — | CN | disclosed |
| US-11022884-B2 | Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2021-06-01 | — | — | US | disclosed |
| US-20170168397-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING HALOGENATED SULFONYLALKYL GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-06-15 | — | — | US | disclosed |