SCHEMBL1897181

SCHEMBL1897181

CC(C)(C)c1ccc([Mg]Cl)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.48
LMNA P02545 1/20 0.46
TYR P14679 1/20 0.46
KIF11 P52732 2/20 0.39
ALDH1A1 P00352 4/20 0.38
HPGD P15428 2/20 0.37
NPC1 O15118 1/20 0.37
MAPT P10636 1/20 0.37
MAPK1 P28482 1/20 0.37
RAB9A P51151 1/20 0.37
HDAC1 Q13547 1/20 0.37
SLC22A2 O15244 1/20 0.37
SLC22A1 O15245 1/20 0.37
SLC22A3 O75751 1/20 0.37
POLB P06746 1/20 0.36
BCHE P06276 3/20 0.36
ACHE P22303 3/20 0.36
ALOX15 P16050 1/20 0.36
HSD17B10 Q99714 1/20 0.36
TDP1 Q9NUW8 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9420191 0.78 TSHR (0.52) TSHRLMNATYRKIF11ALDH1A1
SCHEMBL9180043 0.77 NPC1 (0.44) LMNANPC1MAPTMAPK1RAB9A
SCHEMBL424728 0.76 TSHR (0.73) TSHRLMNATYRKIF11ALDH1A1
SCHEMBL3162653 0.74 GABRA1 (0.46) TSHRALDH1A1HPGDMAPTPOLB
Hydrochloric Acid SCHEMBL28754863 0.74 TSHR (0.48) TSHRLMNATYRKIF11ALDH1A1
SCHEMBL663624 0.74 TSHR (0.48) TSHRLMNATYRKIF11ALDH1A1
Bromide SCHEMBL29077083 0.74 TSHR (0.48) TSHRLMNATYRKIF11ALDH1A1
SCHEMBL3126195 0.74 ALDH1A1 (0.43) TSHRKIF11ALDH1A1
Bromide SCHEMBL2959626 0.72 TSHR (0.46) TSHRLMNATYRKIF11ALDH1A1
Magnesium Chloride Anhydrous SCHEMBL28561945 0.72 TSHR (0.46) TSHRLMNATYRKIF11ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118754917-B Alpha-diimine ligand compound, nickel complex, composite complex, preparation method and application thereof 安徽中科科乐化工科技有限责任公司 2025-01-17 CN claimed
CN-118754917-A Alpha-diimine ligand compound, nickel complex, composite complex, preparation method and application thereof 安徽中科科乐化工科技有限责任公司 2024-10-11 CN claimed
CN-118754917-B Alpha-diimine ligand compound, nickel complex, composite complex, preparation method and application thereof 安徽中科科乐化工科技有限责任公司 2025-01-17 CN disclosed
CN-118754917-A Alpha-diimine ligand compound, nickel complex, composite complex, preparation method and application thereof 安徽中科科乐化工科技有限责任公司 2024-10-11 CN disclosed
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-7947382-B2 Electroluminescent polymers and the use thereof MERCK PATENT GMBH (DE) 2011-05-24 US disclosed
US-20100288974-A1 ELECTROLUMINESCENT POLYMERS AND USE THEREOF MERCK PATENT GMBH (DE) 2010-11-18 US disclosed
US-7642368-B2 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-05 US disclosed
EP-1741149-B1 ELECTROLUMINESCENT POLYMERS AND USE THEROF MERCK PATENT GMBH (DE) 2008-12-24 EP disclosed
EP-1913797-A1 ELECTROLUMINESCENT POLYMERS AND USE THEREOF Merck Patent GmbH (DE) 2008-04-23 EP disclosed
US-7312016-B2 Chemically amplified positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-12-25 US disclosed
US-20070037091-A1 2,4,6-Triisopropylbenzenesulfonate compound capable of generating an acid upon exposure to radiation or electron beams, polymer which changes solubility in alkaline developer under action of acid, and basic compound having high sensitivity, contrast, resolution, storage stability KOITABASHI RYUJI 2007-02-15 US disclosed
WO-2007017066-A1 ELECTROLUMINESCENT POLYMERS AND USE THEREOF MERCK PATENT GMBH (DE) 2007-02-15 WO disclosed
EP-1676835-A1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2006-07-05 EP disclosed
US-20050233245-A1 Chemically amplified positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2005-10-20 US disclosed
EP-0953564-B1 Process for preparing 2-cyanobiphenyl compound SUMIKA FINE CHEMICALS CO LTD (JP) 2001-06-13 EP disclosed
EP-0854135-B1 Process for preparing 2-cyanobiphenyl compound SUMIKA FINE CHEMICALS CO LTD (JP) 2000-02-02 EP disclosed
US-5998652-A Process for preparing 2-cyanobiphenyl compound SUMIKA FINE CHEMICALS CO., LTD. (JP) 1999-12-07 US disclosed
EP-0953564-A1 Process for preparing 2-cyanobiphenyl compound SUMIKA FINE CHEMICALS Co., Ltd. (JP) 1999-11-03 EP disclosed
EP-0854135-A2 Process for preparing 2-cyanobiphenyl compound SUMIKA FINE CHEMICALS Co., Ltd. (JP) 1998-07-22 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100288974-A1 ELECTROLUMINESCENT POLYMERS AND USE THEREOF EPN1, PUF60, MAP1LC3C TSHR 4861/4885LMNA 1843/4885TYR 1065/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.