Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7714268 | 0.84 | — | — | |
| SCHEMBL4581541 | 0.81 | — | — | |
| SCHEMBL1904255 | 0.80 | — | — | |
| SCHEMBL5457410 | 0.78 | — | — | |
| SCHEMBL3135406 | 0.78 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL1898309 | 0.78 | CYP3A4 (0.34) | ALDH1A1 | |
| SCHEMBL8942160 | 0.75 | — | — | |
| SCHEMBL11908579 | 0.74 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL5396425 | 0.73 | — | — | |
| SCHEMBL453582 | 0.72 | EPHX2 (0.31) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1308782-B1 | Chemically amplified positive resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-09-05 | — | — | EP | disclosed |
| US-20110198730-A1 | HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD | LION CORPORATION | 2011-08-18 | — | — | US | disclosed |
| US-20110101503-A1 | HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD | LION CORPORATION (JP) | 2011-05-05 | — | — | US | disclosed |
| US-7312016-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-7288363-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-30 | — | — | US | disclosed |
| US-20070037091-A1 | 2,4,6-Triisopropylbenzenesulfonate compound capable of generating an acid upon exposure to radiation or electron beams, polymer which changes solubility in alkaline developer under action of acid, and basic compound having high sensitivity, contrast, resolution, storage stability | KOITABASHI RYUJI | 2007-02-15 | — | — | US | disclosed |
| US-20050233245-A1 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2005-10-20 | — | — | US | disclosed |
| US-6949323-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-09-27 | — | — | US | disclosed |
| US-20030118934-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-06-26 | — | — | US | disclosed |
| EP-1308782-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-07 | — | — | EP | disclosed |