⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1897672 | 0.81 | ALDH1A1 (0.30) | — | |
| SCHEMBL16893269 | 0.75 | — | — | |
| SCHEMBL5457410 | 0.71 | — | — | |
| SCHEMBL1898309 | 0.71 | CYP3A4 (0.34) | — | |
| SCHEMBL3135406 | 0.71 | ALDH1A1 (0.31) | — | |
| SCHEMBL9987346 | 0.70 | — | — | |
| SCHEMBL452753 | 0.70 | — | — | |
| SCHEMBL452754 | 0.69 | — | — | |
| SCHEMBL8942160 | 0.69 | — | — | |
| SCHEMBL5396425 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7344821-B2 | Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2008-03-18 | — | — | US | disclosed |
| US-20050221224-A1 | Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same | FUJI PHOTO FILM CO., LTD. | 2005-10-06 | — | — | US | disclosed |
| EP-1580601-A1 | Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2005-09-28 | — | — | EP | disclosed |