⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1898309 | 0.79 | CYP3A4 (0.34) | — | |
| SCHEMBL3135406 | 0.79 | ALDH1A1 (0.31) | — | |
| SCHEMBL1897672 | 0.78 | ALDH1A1 (0.30) | — | |
| SCHEMBL650900 | 0.78 | — | — | |
| SCHEMBL8942160 | 0.77 | — | — | |
| SCHEMBL5396425 | 0.74 | — | — | |
| SCHEMBL1315790 | 0.74 | ELANE (0.36) | — | |
| SCHEMBL3953694 | 0.72 | — | — | |
| SCHEMBL4581541 | 0.71 | — | — | |
| SCHEMBL8015746 | 0.69 | HSD11B1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070231741-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-04 | — | — | US | disclosed |
| US-6106998-A | PHOTORESISTS SUITABLE FOR USE IN PHOTOLITHOGRAPHY THAT EMPLOYS AN ARF EXCIMER LASER; HIGH TRANSPARENCY TO EXPOSURE LIGHT HAVING A WAVELENGTH OF 220 NM OR LESS AND DRY-ETCH RESISTANCE | NEC CORPORATION (JP) | 2000-08-22 | — | — | US | disclosed |