SCHEMBL1898445

SCHEMBL1898445

C=C(C)C(=O)O[SiH2]C(C)(C)C(C)C

nearest known ligand 0.39

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.39
ALDH1A1 P00352 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2185442 0.85 TSHR (0.37) TSHRALDH1A1
SCHEMBL4643914 0.81 TSHR (0.43) TSHRALDH1A1
SCHEMBL1087681 0.79 ALDH1A1 (0.44) TSHRALDH1A1
SCHEMBL10400394 0.77
SCHEMBL1899460 0.72 TSHR (0.39) TSHRALDH1A1
SCHEMBL28482632 0.71 TSHR (0.36) TSHRALDH1A1
SCHEMBL2854151 0.71 ALDH1A1 (0.38) TSHRALDH1A1
SCHEMBL17713691 0.70 TSHR (0.45) TSHRALDH1A1
SCHEMBL438463 0.70 TSHR (0.45) TSHRALDH1A1
SCHEMBL7719672 0.70 TSHR (0.45) TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110198730-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION 2011-08-18 US disclosed
US-20110101503-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION (JP) 2011-05-05 US disclosed
EP-0519439-B1 Binders for diazo resins FUJI PHOTO FILM CO LTD (JP) 1997-12-03 EP disclosed
US-5346975-A For wear resistant lithographic printing plates; photocrosslinkable; from maleimido group containing macromer FUJI PHOTO FILM CO., LTD. (JP) 1994-09-13 US disclosed
US-5300397-A Enhanced sensitivity FUJI PHOTO FILM CO., LTD. (JP) 1994-04-05 US disclosed
EP-0519439-A2 Binders for diazo resins FUJI PHOTO FILM CO., LTD. (JP) 1992-12-23 EP disclosed