SCHEMBL19005972

SCHEMBL19005972

CNc1ccc(Cc2ccc(N)c(O)c2)cc1O

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 6/20 0.71
MAPT P10636 4/20 0.71
KDM4E B2RXH2 3/20 0.71
MEN1 O00255 2/20 0.71
KMT2A Q03164 2/20 0.71
POLB P06746 1/20 0.71
RAB9A P51151 1/20 0.71
CA1 P00915 1/20 0.45
CA2 P00918 1/20 0.45
CA4 P22748 1/20 0.45
CA6 P23280 1/20 0.45
TDP1 Q9NUW8 1/20 0.44
ALDH1A1 P00352 5/20 0.44
ALOX15 P16050 3/20 0.44
HSD17B10 Q99714 3/20 0.44
TSHR P16473 2/20 0.44
HPGD P15428 2/20 0.44
CYP3A4 P08684 2/20 0.41
ESR1 P03372 1/20 0.41
ESR2 Q92731 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL436819 0.84 MAPT (1.00) GAAMAPTKDM4EMEN1KMT2A
SCHEMBL29871296 0.84 MAPT (1.00) GAAMAPTKDM4EMEN1KMT2A
SCHEMBL30350976 0.84 MAPT (1.00) GAAMAPTKDM4EMEN1KMT2A
SCHEMBL20224598 0.83 GAA (0.53) GAAMAPTKDM4EMEN1KMT2A
Hydrochloric Acid SCHEMBL21173968 0.82 MAPT (0.95) GAAMAPTKDM4EMEN1KMT2A
SCHEMBL9605413 0.77 TRPA1 (0.59) GAAMAPTKDM4EMEN1KMT2A
SCHEMBL8514724 0.77 GAA (0.83) GAAMAPTKDM4EMEN1KMT2A
SCHEMBL565082 0.77 KDM4E (0.83) GAAMAPTKDM4EMEN1KMT2A
SCHEMBL565037 0.77 MAPT (0.83) GAAMAPTKDM4EMEN1KMT2A
SCHEMBL5722031 0.76 MAPT (0.67) GAAMAPTKDM4EMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3182205-B1 PHOTOSENSITIVE RESIN COMPOSITION, LITHOGRAPHIC PRINTING ORIGINAL PLATE, METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE, AND POLYMER COMPOUND FUJIFILM CORP (JP) 2021-04-07 EP disclosed
EP-3182205-A1 PHOTOSENSITIVE RESIN COMPOSITION, LITHOGRAPHIC PRINTING ORIGINAL PLATE, METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE, AND POLYMER COMPOUND Fujifilm Corporation (JP) 2017-06-21 EP disclosed