SCHEMBL436819

SCHEMBL436819

Nc1ccc(Cc2ccc(N)c(O)c2)cc1O

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 1.00
GAA P10253 3/20 1.00
KDM4E B2RXH2 3/20 1.00
MEN1 O00255 1/20 1.00
POLB P06746 1/20 1.00
RAB9A P51151 1/20 1.00
KMT2A Q03164 1/20 1.00
CA1 P00915 1/20 0.61
CA2 P00918 1/20 0.61
CA4 P22748 1/20 0.61
CA6 P23280 1/20 0.61
CYP3A4 P08684 3/20 0.54
ALOX15 P16050 3/20 0.54
HSD17B10 Q99714 3/20 0.54
ALDH1A1 P00352 5/20 0.52
CDC25B P30305 1/20 0.52
CASP6 P55212 1/20 0.52
RCE1 Q9Y256 1/20 0.52
IDH1 O75874 1/20 0.50
ESR1 P03372 2/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29871296 1.00 MAPT (1.00) MAPTGAAKDM4EMEN1POLB
SCHEMBL30350976 1.00 MAPT (1.00) MAPTGAAKDM4EMEN1POLB
Hydrochloric Acid SCHEMBL21173968 0.98 MAPT (0.95) MAPTGAAKDM4EMEN1POLB
SCHEMBL565037 0.91 MAPT (0.83) MAPTGAAKDM4EMEN1POLB
SCHEMBL8514724 0.91 GAA (0.83) MAPTGAAKDM4EMEN1POLB
SCHEMBL565082 0.91 KDM4E (0.83) MAPTGAAKDM4EMEN1POLB
SCHEMBL564637 0.89 KDM4E (0.80) MAPTGAAKDM4EMEN1POLB
SCHEMBL565515 0.86 KDM4E (0.74) MAPTGAAKDM4EMEN1POLB
SCHEMBL564996 0.86 KDM4E (0.74) MAPTGAAKDM4EMEN1POLB
SCHEMBL9008928 0.85 KDM4E (0.74) MAPTGAAKDM4EMEN1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 579 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105315666-B Transparent polymer film, electronic device including the same, and composition 三星电子株式会社 2020-03-10 CN claimed
EP-3512905-A1 METHOD FOR PRODUCING A POLYBENZAZOL POLYMER (P) BASF SE (DE) 2019-07-24 EP claimed
WO-2018050489-A1 METHOD FOR PRODUCING A POLYBENZAZOL POLYMER (P) BASF SE (DE) 2018-03-22 WO claimed
US-20160009862-A1 TRANSPARENT POLYMER FILM AND ELECTRONIC DEVICE INCLUDING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2016-01-14 US claimed
US-20070009751-A1 Polyamic acid resin composition modified with laminate nanometer silica sheet and polyimide prepared therefrom CHANG CHUN PLASTICS CO., LTD. (TW) 2007-01-11 US claimed
US-7005163-B2 Organic-inorganic hybrid film material and its fabrication CHANG CHUN PLASTICS CO., LTD. (TW) 2006-02-28 US claimed
US-6875554-B2 Positive photosensitive polyimide resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2005-04-05 US claimed
US-20040110014-A1 Organic-inorganic hybrid film material and its fabrication CHANG CHUN PLASTICS CO., LTD. (TW) 2004-06-10 US claimed
US-4927736-A Hydroxy polyimides and high temperature positive photoresists therefrom HOECHST CELANESE CORPORATION (US) 1990-05-22 US claimed
EP-4748892-A1 RESIN COMPOSITION, PREPREG, RESIN FILM, LAMINATE, PRINTED WIRING BOARD, AND SEMICONDUCTOR PACKAGE Resonac Corporation (JP) 2026-05-27 EP disclosed
EP-4624527-A1 RESIN COMPOSITION, PREPREG, RESIN FILM, LAMINATE, PRINTED WIRING BOARD AND SEMICONDUCTOR PACKAGE Resonac Corporation (JP) 2025-10-01 EP disclosed
US-12422750-B2 Method of manufacturing cured film, photocurable resin composition, method of manufacturing laminate, and method of manufacturing semiconductor device FUJIFILM CORPORATION (JP) 2025-09-23 US disclosed
EP-4596607-A1 RESIN COMPOSITION, CURED OBJECT, LAYERED PRODUCT, METHOD FOR PRODUCING CURED OBJECT, METHOD FOR PRODUCING LAYERED PRODUCT, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM Corporation (JP) 2025-08-06 EP disclosed
EP-4597225-A1 FILM PRODUCTION METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT PRODUCTION METHOD, CURED PRODUCT, AND LAMINATE FUJIFILM Corporation (JP) 2025-08-06 EP disclosed
EP-0141781-A2 Light-sensitive coating composition and use thereof CIBA-GEIGY AG (CH) 1985-05-15 EP disclosed
EP-0134752-A1 Layered material and its use CIBA-GEIGY AG (CH) 1985-03-20 EP disclosed
EP-0132221-A1 Polyimide, process for its preparation and its use CIBA-GEIGY AG (CH) 1985-01-23 EP disclosed
EP-0119162-A2 Photopolymerisable composition, material coated therewith, and process for obtaining relief images CIBA-GEIGY AG (CH) 1984-09-19 EP disclosed
US-4458041-A MOLDING MATERIALS, ADHESIVES CHERNIKHOV ALEXEI Y (SU) 1984-07-03 US disclosed
US-3960980-A Method of producing elastomer resins BRIDGESTONE TIRE COMPANY LIMITED (JA) 1976-06-01 US disclosed