SCHEMBL190371

SCHEMBL190371

CC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14790659 0.85 ALDH1A1 (0.30)
SCHEMBL13986583 0.85 ALDH1A1 (0.30)
SCHEMBL27923902 0.83
SCHEMBL6046647 0.83
SCHEMBL703375 0.76
SCHEMBL707166 0.76
SCHEMBL5373891 0.75 TSHR (0.43)
SCHEMBL191827 0.75
SCHEMBL702976 0.73
SCHEMBL429653 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 693 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8344238-B2 Self-cleaning protective coatings for use with photovoltaic cells SOLYNDRA LLC (US) 2013-01-01 US claimed
US-20110000539-A1 Self-cleaning protective coatings for use with photovoltaic cells SOLYNDRA, INC. (US) 2011-01-06 US claimed
US-20100326495-A1 Self-cleaning protective coatings for use with photovoltaic cells SOLYNDRA, INC. (US) 2010-12-30 US claimed
US-20070017567-A1 Self-cleaning protective coatings for use with photovoltaic cells BARNES, CHRISTOPHER 2007-01-25 US claimed
WO-2007012026-A1 SELF-CLEANING COATINGS SOLYNDRA, INC. (US) 2007-01-25 WO claimed
EP-4724410-A1 HYDROPHOBIZED RECYCLED CONCRETE AGGREGATES, METHODS FOR THEIR MANUFACTURE, AND USE OF THE HYDROPHOBIZED RECYCLED CONCRETE AGGREGATES IN CEMENTITIOUS COMPOSITIONS Sika Technology AG (CH) 2026-04-15 EP disclosed
WO-2024251683-A1 HYDROPHOBIZED RECYCLED CONCRETE AGGREGATES, METHODS FOR THEIR MANUFACTURE, AND USE OF THE HYDROPHOBIZED RECYCLED CONCRETE AGGREGATES IN CEMENTITIOUS COMPOSITIONS SIKA TECHNOLOGY AG (CH) 2024-12-12 WO disclosed
EP-4474364-A1 HYDROPHOBIZED RECYCLED CONCRETE AGGREGATES, METHODS FOR THEIR MANUFACTURE, AND USE OF THE HYDROPHOBIZED RECYCLED CONCRETE AGGREGATES IN CEMENTITIOUS COMPOSITIONS Sika Technology AG (CH) 2024-12-11 EP disclosed
US-12109812-B2 Ink jet printing method and ink jet printing apparatus SEIKO EPSON CORPORATION (JP) 2024-10-08 US disclosed
WO-2024190380-A1 SILICON-CONTAINING RESIN COMPOSITION PURIFIED PRODUCT MANUFACTURING METHOD, PATTERN FORMATION METHOD, AND SILICON-CONTAINING RESIN COMPOSITION PURIFIED PRODUCT 東京応化工業株式会社 2024-09-19 WO disclosed
US-20240262964-A1 METHOD OF PRODUCING SILICONE POLYMER TORAY FINE CHEMICALS CO., LTD. (JP) 2024-08-08 US disclosed
EP-4361201-A1 METHOD FOR PRODUCING SILICONE POLYMER Toray Fine Chemicals Co., Ltd. (JP) 2024-05-01 EP disclosed
US-6013372-A SELF-CLEANING, WEAR RESISTANT COATING TOTO, LTD. (JP) 2000-01-11 US disclosed
EP-0941839-A2 Radiant ray-sensitive lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 1999-09-15 EP disclosed
EP-0932081-A1 PATTERN FORMING BODY, PATTERN FORMING METHOD, AND THEIR APPLICATIONS DAI NIPPON PRINTING CO., LTD. (JP) 1999-07-28 EP disclosed
EP-0921561-A2 Composition for film formation and film JSR Corporation (JP) 1999-06-09 EP disclosed
EP-0903389-A1 ANTIFOULING MEMBER AND ANTIFOULING COATING COMPOSITION TOTO LTD. (JP) 1999-03-24 EP disclosed
EP-0228095-B1 PROCESS FOR THE PREPARATION OF OLEFINIC SILANES AND SILOXANES UNION CARBIDE CORPORATION (US) 1992-01-22 EP disclosed
EP-0228095-A2 Process for the preparation of olefinic silanes and siloxanes UNION CARBIDE CORPORATION (US) 1987-07-08 EP disclosed
US-4668812-A Process for the preparation of olefinic silanes and siloxanes UNION CARBIDE CORPORATION (US) 1987-05-26 US disclosed