Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 13/20 | 0.48 |
| ▸ | LMNA | P02545 | 1/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.48 |
| ▸ | PGR | P06401 | 1/20 | 0.48 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.48 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.48 |
| ▸ | AR | P10275 | 1/20 | 0.48 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.48 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.48 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.48 |
| ▸ | DRD1 | P21728 | 1/20 | 0.48 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.48 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.48 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.48 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.48 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.48 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2629346 | 0.83 | ESR1 (0.48) | ESR1LMNACYP1A2PGRCHRM2 | |
| SCHEMBL19084288 | 0.82 | CYP2C9 (0.52) | ESR1LMNACYP1A2PGRCHRM2 | |
| SCHEMBL10339282 | 0.81 | ESR1 (0.50) | ESR1LMNACYP1A2PGRCHRM2 | |
| SCHEMBL10245468 | 0.79 | AOC3 (0.35) | LMNA | |
| SCHEMBL22022476 | 0.79 | ALDH1A1 (0.41) | CYP1A2CYP3A4CYP2D6CYP2C9ALOX15 | |
| SCHEMBL14014347 | 0.79 | ESR1 (0.48) | ESR1LMNACYP1A2PGRCHRM2 | |
| SCHEMBL19231609 | 0.79 | ADRB2 (0.45) | LMNAMAPTSLC6A2SLC6A3TDP1 | |
| SCHEMBL19153487 | 0.79 | TDP1 (0.46) | LMNACYP1A2CYP3A4ADORA3CYP2D6 | |
| SCHEMBL68538 | 0.78 | RIPK1 (0.45) | LMNACHRM2CHRM1ADRA1ASLC6A3 | |
| SCHEMBL8751432 | 0.78 | ESR1 (0.56) | ESR1LMNACYP1A2PGRCHRM2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2022043236-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST FILM USING THE SAME | MERCK PATENT GMBH (DE) | 2022-03-03 | — | — | WO | disclosed |
| US-20120161296-A1 | MULTIPLE PATTERNING USING IMPROVED PATTERNABLE LOW-k DIELECTRIC MATERIALS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-06-28 | — | — | US | disclosed |
| US-8187789-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-05-29 | — | — | US | disclosed |
| US-8163658-B2 | Multiple patterning using improved patternable low-k dielectric materials | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-04-24 | — | — | US | disclosed |
| US-8062750-B2 | Epoxy resin composition for prepreg, prepreg and multilayered printed wiring board | MATSUSHITA ELECTRIC WORKS, LTD. (JP) | 2011-11-22 | — | — | US | disclosed |
| US-20110042790-A1 | MULTIPLE PATTERNING USING IMPROVED PATTERNABLE LOW-k DIELECTRIC MATERIALS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-02-24 | — | — | US | disclosed |
| US-20090269700-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-10-29 | — | — | US | disclosed |