SCHEMBL19130780

SCHEMBL19130780

CCN(CC)c1ccc(C(=O)O)cc1F

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HCAR3 P49019 4/20 0.59
MAPK1 P28482 4/20 0.49
HTT P42858 3/20 0.49
RAB9A P51151 3/20 0.49
LMNA P02545 1/20 0.49
TP53 P04637 1/20 0.44
RARB P10826 6/20 0.43
KMT2A Q03164 5/20 0.42
MEN1 O00255 4/20 0.42
NPC1 O15118 2/20 0.42
RARA P10276 5/20 0.41
RARG P13631 5/20 0.41
SMN1; SMN2 Q16637 3/20 0.41
ALDH1A1 P00352 4/20 0.41
MAPT P10636 3/20 0.41
POLB P06746 2/20 0.41
THRB P10828 2/20 0.41
PKM P14618 2/20 0.41
HPGD P15428 2/20 0.41
MDM2 Q00987 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29475663 0.80 HCAR3 (0.56) HCAR3MAPK1HTTRAB9ALMNA
SCHEMBL9408674 0.80 HCAR3 (0.56) HCAR3MAPK1HTTRAB9ALMNA
SCHEMBL3529075 0.79 HCAR3 (0.55) HCAR3HTTRAB9ATP53RARB
SCHEMBL15574025 0.77 CA12 (0.59) HCAR3MAPK1HTTRAB9ALMNA
SCHEMBL10692091 0.76 HCAR3 (0.55) HCAR3MAPK1HTTRAB9ATP53
SCHEMBL24510434 0.75 LMNA (0.47) HCAR3MAPK1HTTRAB9ALMNA
SCHEMBL10502222 0.74 HCAR3 (1.00) HCAR3MAPK1HTTRAB9ALMNA
SCHEMBL14754339 0.74 HCAR3 (0.35) HCAR3HTTSMN1; SMN2ALDH1A1MAPT
SCHEMBL4124943 0.74 EPHX2 (0.55) MAPK1HTTRAB9ALMNATP53
SCHEMBL5716046 0.74 CYP3A4 (0.46) MAPK1HTTALDH1A1MAPTTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10649332-B2 Resist composition and patterning process SHIN-ETSU CHEMICLA CO., LTD. (JP) 2020-05-12 US disclosed
US-20190354012-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-11-21 US disclosed
US-9958777-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-01 US disclosed
US-9958777-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-01 US disclosed
US-20170205709-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-07-20 US disclosed
US-20170205709-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-07-20 US disclosed