SCHEMBL19216503

SCHEMBL19216503

Cc1ccc(NC(=O)N(C(=O)Nc2ccc(C)cc2)c2ccc(C)cc2)cc1

nearest known ligand 0.66

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.55
RAB9A P51151 5/20 0.54
SMN1; SMN2 Q16637 2/20 0.54
ALDH1A1 P00352 2/20 0.54
POLB P06746 2/20 0.53
NPC1 O15118 3/20 0.52
KIF11 P52732 1/20 0.48
TGM2 P21980 1/20 0.48
KDM4E B2RXH2 1/20 0.48
MAPT P10636 3/20 0.47
HSD17B10 Q99714 1/20 0.47
PPARG P37231 1/20 0.46
RXFP1 Q9HBX9 1/20 0.46
NR2E3 Q9Y5X4 1/20 0.46
NCOR2 Q9Y618 1/20 0.46
HTT P42858 1/20 0.46
NMT1 P30419 1/20 0.46
HPGD P15428 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27922535 0.86 POLB (0.49) TDP1RAB9ASMN1; SMN2ALDH1A1POLB
SCHEMBL3063259 0.86 KIF11 (0.49) TDP1RAB9ASMN1; SMN2ALDH1A1POLB
SCHEMBL9547555 0.84 TDP1 (0.55) TDP1RAB9ASMN1; SMN2ALDH1A1POLB
SCHEMBL5705038 0.81 TDP1 (0.52) TDP1RAB9ASMN1; SMN2ALDH1A1POLB
SCHEMBL11373630 0.81 TDP1 (0.52) TDP1RAB9ASMN1; SMN2ALDH1A1POLB
SCHEMBL4770587 0.79 TSHR (0.68) TDP1RAB9ASMN1; SMN2ALDH1A1POLB
SCHEMBL13830657 0.78 TSHR (0.49) TDP1RAB9ASMN1; SMN2ALDH1A1POLB
SCHEMBL28431265 0.78 TDP1 (0.57) TDP1RAB9ASMN1; SMN2ALDH1A1POLB
SCHEMBL14557542 0.78 GAA (0.61) TDP1RAB9ASMN1; SMN2ALDH1A1POLB
SCHEMBL19707945 0.77 TGM2 (0.43) TDP1RAB9ASMN1; SMN2ALDH1A1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10201911-B2 Continuous process for forming a unitary mat BASF SE (DE) 2019-02-12 US disclosed
US-20170225355-A1 Continuous Process For Forming A Unitary Mat BASF CORPORATION 2017-08-10 US disclosed