SCHEMBL19222211

SCHEMBL19222211

CC(I)(CI)C(=O)OCc1cccc2c(O)cccc12

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 7/20 0.35
▸ ESR2 Q92731 7/20 0.35
▸ CYBB P04839 1/20 0.35
▸ KDM4E B2RXH2 1/20 0.35
▸ ALDH1A1 P00352 1/20 0.35
▸ GLA P06280 1/20 0.35
▸ CHRM2 P08172 2/20 0.34
▸ CHRM4 P08173 2/20 0.34
▸ CHRM5 P08912 2/20 0.34
▸ CHRM1 P11229 2/20 0.34
▸ CHRM3 P20309 2/20 0.34
▸ CDC25B P30305 2/20 0.34
▸ CA12 O43570 1/20 0.33
▸ CA1 P00915 1/20 0.33
▸ CA2 P00918 1/20 0.33
▸ CA7 P43166 1/20 0.33
▸ CA9 Q16790 1/20 0.33
▸ CA14 Q9ULX7 1/20 0.33
▸ CDK2 P24941 1/20 0.33
▸ MEN1 O00255 4/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18671832 0.89 CDC25B (0.37) ESR1ESR2CYBBKDM4EALDH1A1
SCHEMBL19558277 0.84 KDM4E (0.44) ESR1ESR2CYBBKDM4EALDH1A1
SCHEMBL18671830 0.81 IDO1 (0.35) KDM4EALDH1A1GLACHRM2CHRM4
SCHEMBL15189314 0.81 CDC25B (0.39) ESR1ESR2CYBBKDM4EALDH1A1
SCHEMBL8738362 0.81 CDC25B (0.39) ESR1ESR2CYBBALDH1A1CHRM2
SCHEMBL14577613 0.77 CYBB (0.34) ESR1ESR2CYBBKDM4EALDH1A1
SCHEMBL17424794 0.76 IAPP (0.36) CYBBALDH1A1CHRM2CHRM4CHRM5
SCHEMBL17901894 0.76 CDC25B (0.36) ESR1ESR2CYBBKDM4EALDH1A1
SCHEMBL20215425 0.76 TYR (0.36) KDM4ECDC25BCA12CA1CA2
SCHEMBL18671963 0.76 KDM4E (0.43) KDM4EALDH1A1GLAGAAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3203319-B1 POLYMER COMPOUND, NEGATIVE RESIST COMPOSITION, LAMINATE, PATTERNING PROCESS, AND COMPOUND SHINETSU CHEMICAL CO (JP) 2018-06-20 — — EP disclosed
EP-3203319-A1 POLYMER COMPOUND, NEGATIVE RESIST COMPOSITION, LAMINATE, PATTERNING PROCESS, AND COMPOUND Shin-Etsu Chemical Co., Ltd. (JP) 2017-08-09 — — EP disclosed
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