Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.43 |
| ▸ | GLA | P06280 | 2/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.35 |
| ▸ | CASP1 | P29466 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 2/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.34 |
| ▸ | NLRP3 | Q96P20 | 1/20 | 0.33 |
| ▸ | MAOB | P27338 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18671832 | 0.86 | CDC25B (0.37) | KDM4EALDH1A1GLAGAA | |
| SCHEMBL12419176 | 0.86 | ALDH1A1 (0.41) | KDM4EALDH1A1GLAHSD17B10HPGD | |
| SCHEMBL18671962 | 0.85 | MMP1 (0.38) | KDM4EALDH1A1GLAHPGDCYP1A2 | |
| SCHEMBL18671843 | 0.85 | EPHX1 (0.45) | KDM4EALDH1A1GLAHPGDL3MBTL1 | |
| SCHEMBL18671830 | 0.81 | IDO1 (0.35) | KDM4EALDH1A1GLANPSR1GAA | |
| SCHEMBL19222211 | 0.76 | ESR1 (0.35) | KDM4EALDH1A1GLAHSD17B10NPSR1 | |
| SCHEMBL20215425 | 0.74 | TYR (0.36) | KDM4E | |
| SCHEMBL15189314 | 0.72 | CDC25B (0.39) | KDM4EALDH1A1GLAHSD17B10NPSR1 | |
| SCHEMBL8738362 | 0.72 | CDC25B (0.39) | ALDH1A1GAA | |
| SCHEMBL18671841 | 0.72 | ALDH1A1 (0.53) | KDM4EALDH1A1HPGDLMNAL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220404701-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION, PHOTOMASK BLANK, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING POLYMER COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-12-22 | — | — | US | disclosed |
| US-9604921-B2 | Sulfonium salt, resist composition and resist pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-03-28 | — | — | US | disclosed |