Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.32 |
| ▸ | ACHE | P22303 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA7 | P43166 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
| ▸ | PARP1 | P09874 | 1/20 | 0.31 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.31 |
| ▸ | PARP11 | Q9NR21 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30667121 | 0.78 | CYP2A6 (0.35) | CYP1A2CYP2A6ACHEALDH1A1CA1 | |
| SCHEMBL5953457 | 0.78 | CYP2A6 (0.35) | CYP1A2CYP2A6ACHEALDH1A1CA1 | |
| SCHEMBL1923169 | 0.71 | TRPA1 (0.38) | CYP1A2ACHEALDH1A1CA1CA2 | |
| SCHEMBL16131317 | 0.69 | CA1 (0.38) | CYP2A6ACHEALDH1A1CA1CA2 | |
| SCHEMBL1923737 | 0.68 | CYP1A2 (0.33) | CYP1A2CYP2A6ACHEALDH1A1CA1 | |
| SCHEMBL1923251 | 0.68 | CYP1A2 (0.33) | CYP1A2CYP2A6ACHEALDH1A1CA1 | |
| SCHEMBL28406255 | 0.65 | ACHE (0.42) | CYP1A2CYP2A6ACHEALDH1A1CA1 | |
| SCHEMBL5954183 | 0.64 | MEN1 (0.33) | CYP1A2CYP2A6ACHEALDH1A1 | |
| SCHEMBL12602259 | 0.63 | — | — | |
| SCHEMBL12602256 | 0.63 | ALDH1A1 (0.32) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2328864-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION | FUJIFILM Corporation (JP) | 2011-06-08 | — | — | EP | disclosed |
| WO-2010035905-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-04-01 | — | — | WO | disclosed |
| WO-2009038031-A1 | BLOCK COPOLYMER AND PRODUCTION PROCESS THEREOF | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-03-26 | — | — | WO | disclosed |
| EP-1641848-A1 | PHOTORESIST POLYMER COMPOSITIONS | JSR Corporation (JP) | 2006-04-05 | — | — | EP | disclosed |
| WO-2005003198-A1 | PHOTORESIST POLYMER COMPOSITIONS | JSR CORPORATION (JP) | 2005-01-13 | — | — | WO | disclosed |