⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL60224 | 0.82 | CYP2A6 (0.38) | — | |
| SCHEMBL9507625 | 0.71 | — | — | |
| SCHEMBL6860163 | 0.71 | — | — | |
| SCHEMBL8962336 | 0.65 | METAP2 (0.32) | — | |
| SCHEMBL6860315 | 0.65 | — | — | |
| SCHEMBL17044627 | 0.65 | ALDH1A1 (0.31) | — | |
| SCHEMBL9324824 | 0.65 | CYP2A6 (0.35) | — | |
| SCHEMBL452611 | 0.64 | EGFR (0.30) | — | |
| SCHEMBL453578 | 0.64 | KDM4E (0.30) | — | |
| SCHEMBL4957247 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9719018-B2 | Monomer, liquid crystal composition, liquid crystal display device, and production method for liquid crystal display device | SHARP KABUSHIKI KAISHA (JP) | 2017-08-01 | — | — | US | claimed |
| EP-2049471-B1 | PROCESS FOR PREPARING A SULPHONIC ACID ANHYDRIDE | RHODIA OPERATIONS (FR) | 2016-07-13 | — | — | EP | claimed |
| US-8222450-B2 | Preparation of sulfonic acid anhydrides | Aubervilliers (FR) | 2012-07-17 | — | — | US | claimed |
| US-20100076221-A1 | PREPARATION OF SULFONIC ACID ANHYDRIDES | RHODIA OPERATIONS (FR) | 2010-03-25 | — | — | US | claimed |
| US-20240122065-A1 | METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | TOSOH CORPORATION (JP) | 2024-04-11 | — | — | US | disclosed |
| WO-2023162653-A1 | RESIST UNDERLAYER FILM FORMATION COMPOSITION | 日産化学株式会社 | 2023-08-31 | — | — | WO | disclosed |
| EP-4198163-A1 | METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | Tosoh Corporation (JP) | 2023-06-21 | — | — | EP | disclosed |
| WO-2023013697-A1 | MATERIAL FOR METAL PATTERNING, FLUORO COMPOUND, THIN FILM FOR METAL PATTERNING, ORGANIC ELECTROLUMINESCENCE DEVICE, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | 東ソー株式会社 | 2023-02-09 | — | — | WO | disclosed |
| US-11326024-B2 | Polyamide resin, molded body, laminate, medical device, and polyamide resin production method | KANEKA CORPORATION (JP) | 2022-05-10 | — | — | US | disclosed |
| US-20210277183-A1 | POLYAMIDE RESIN, MOLDED BODY, LAMINATE, MEDICAL DEVICE, AND POLYAMIDE RESIN PRODUCTION METHOD | KANEKA CORPORATION (JP) | 2021-09-09 | — | — | US | disclosed |
| WO-2020138189-A1 | FILM FORMING COMPOSITION | 日産化学株式会社 | 2020-07-02 | — | — | WO | disclosed |
| US-10077254-B2 | Tetrazolinone compound and use thereof | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-09-18 | — | — | US | disclosed |
| US-8222450-B2 | Preparation of sulfonic acid anhydrides | Aubervilliers (FR) | 2012-07-17 | — | — | US | disclosed |
| US-7956145-B2 | Polymerization of 1,6-heptadiene in the presence of a catalyst formed by contacting a transition metal with a diimino aluminum or boron compound, giving a polymer structure of alternating ethylene and cyclopentene; superior balance between a heat resistance and workability | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-06-07 | — | — | US | disclosed |
| US-20100076221-A1 | PREPARATION OF SULFONIC ACID ANHYDRIDES | RHODIA OPERATIONS (FR) | 2010-03-25 | — | — | US | disclosed |
| US-20080234450-A1 | DIENE POLYMER AND PROCESS FOR PRODUCING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-09-25 | — | — | US | disclosed |
| US-6794530-B1 | 1,4-ADDITION OF MONOHYDRIC OR POLYHYDRIC ALCOHOLS TO ALPHA , BETA -UNSATURATED NITRILES | BASF AKTIENGESELLSCHAFT (DE) | 2004-09-21 | — | — | US | disclosed |
| EP-0934925-B1 | Process for the preparation of beta-alkoxy nitriles | BASF AG (DE) | 2002-09-25 | — | — | EP | disclosed |
| EP-0934925-A1 | Process for the preparation of beta-alkoxy nitriles | BASF AKTIENGESELLSCHAFT (DE) | 1999-08-11 | — | — | EP | disclosed |
| US-5389479-A | Excellent sensitivity in positive charge; multilayer consists of charge generating and charge transferring layer | SHARP KABUSHIKI KAISHA (JP) | 1995-02-14 | — | — | US | disclosed |