SCHEMBL19322855

SCHEMBL19322855

CCC(C)(C)Oc1ccc(C(c2ccc(Oc3ccc(C(=O)c4ccc(C(C)C)cc4)cc3)c(N)c2)(C(F)(F)F)C(F)(F)F)cc1N

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 5/20 0.42
▸ L3MBTL1 Q9Y468 4/20 0.42
▸ LMNA P02545 3/20 0.42
▸ ATM Q13315 1/20 0.42
▸ RAB9A P51151 3/20 0.39
▸ USP2 O75604 2/20 0.34
▸ NPC1 O15118 2/20 0.34
▸ SMN1; SMN2 Q16637 2/20 0.34
▸ HSD17B10 Q99714 1/20 0.34
▸ FGFR2 P21802 1/20 0.34
▸ SLC6A2 P23975 3/20 0.34
▸ SLC6A4 P31645 3/20 0.34
▸ FFAR1 O14842 4/20 0.33
▸ NPSR1 Q6W5P4 1/20 0.33
▸ KDM4E B2RXH2 1/20 0.33
▸ ALDH1A1 P00352 2/20 0.32
▸ HTT P42858 2/20 0.32
▸ ACACB O00763 1/20 0.32
▸ MAPK1 P28482 1/20 0.31
▸ KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19986790 0.84 MAPT (0.44) MAPTL3MBTL1LMNAATMRAB9A
SCHEMBL12807707 0.75 HSD11B1 (0.36) SLC6A4FFAR1
SCHEMBL19318201 0.75 L3MBTL1 (0.52) MAPTL3MBTL1LMNAATMRAB9A
SCHEMBL10029047 0.75 PPARG (0.45) MAPTLMNAATMRAB9AUSP2
SCHEMBL19322842 0.74 PPARG (0.41) MAPTLMNAATMRAB9AUSP2
SCHEMBL13866395 0.73 PPARG (0.48) MAPTLMNAATMRAB9AUSP2
SCHEMBL11708266 0.72 L3MBTL1 (0.71) MAPTL3MBTL1LMNAATMRAB9A
SCHEMBL12807700 0.72 SCN9A (0.33) MAPTL3MBTL1LMNAATMSMN1; SMN2
SCHEMBL12969427 0.72 MMP13 (0.36) MAPTLMNAATMRAB9AUSP2
SCHEMBL11993883 0.72 MMP13 (0.44) MAPTLMNARAB9ANPC1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170253764-A1 FILM-FORMING COMPOSITION INCLUDING THERMOSETTING RESIN NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-09-07 — — US disclosed
Send feedback