Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 3/20 | 0.52 |
| ▸ | CES1 | P23141 | 3/20 | 0.52 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | CA1 | P00915 | 2/20 | 0.48 |
| ▸ | CA2 | P00918 | 2/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.48 |
| ▸ | ELANE | P08246 | 1/20 | 0.46 |
| ▸ | NPC1 | O15118 | 1/20 | 0.46 |
| ▸ | RAB9A | P51151 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | GSK3B | P49841 | 2/20 | 0.45 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.45 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.45 |
| ▸ | PPARA | Q07869 | 2/20 | 0.44 |
| ▸ | FABP2 | P12104 | 1/20 | 0.44 |
| ▸ | PPARG | P37231 | 1/20 | 0.44 |
| ▸ | SLC22A12 | Q96S37 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10940129 | 0.94 | CES2 (0.64) | CES2CES1ALOX15TSHRPOLB | |
| SCHEMBL10943769 | 0.94 | MAPK1 (0.55) | CES2CES1ALOX15TSHRPOLB | |
| SCHEMBL11298330 | 0.88 | CA2 (0.46) | CES2CES1TSHRCA2ELANE | |
| SCHEMBL198250 | 0.84 | CES2 (0.54) | CES2CES1ALOX15TSHRPOLB | |
| SCHEMBL17187854 | 0.84 | CES2 (0.54) | CES2CES1ALOX15TSHRPOLB | |
| SCHEMBL9329708 | 0.82 | ALDH1A1 (0.42) | CES2CES1TSHRPOLBCA2 | |
| SCHEMBL10887646 | 0.82 | CES2 (0.52) | CES2CES1ALOX15TSHRPOLB | |
| SCHEMBL3443593 | 0.82 | CES2 (0.52) | CES2CES1ALOX15TSHRPOLB | |
| SCHEMBL15251658 | 0.81 | RXRA (0.44) | CA1CA2NPC1RAB9ASMN1; SMN2 | |
| SCHEMBL4419639 | 0.81 | ALDH1A1 (0.50) | CA2ELANESRD5A2HPGDMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 97 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4717605-A | PHOTOPOLYMERIZING POLYEPOXIDE SYSTEMS, UNSATURATED COMPONENTS, FREE RADICAL INITIATORS | MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) | 1988-01-05 | — | — | US | claimed |
| EP-0107198-B1 | USE OF 2-HYDROXY-2-METHYL-(P-CHLOROPROPIONPHENONE) AS A PHOTOINITIATOR | CIBA-GEIGY AG (CH) | 1987-07-08 | — | — | EP | claimed |
| EP-0107198-A1 | Use of 2-hydroxy-2-methyl-(p-chloropropionphenone) as a photoinitiator | CIBA-GEIGY AG (CH) | 1984-05-02 | — | — | EP | claimed |
| US-4308400-A | AROMATIC HYDROXY KETONES | CIBA-GEIGY A.G. (CH) | 1981-12-29 | — | — | US | claimed |
| EP-0003002-A2 | Use of aromatic-aliphatic ketones as photoinitiators, photopolymerisable systems containing such ketones and aromatic-aliphatic ketones | CIBA-GEIGY AG (CH) | 1979-07-11 | — | — | EP | claimed |
| JP-1308404-A | — | — | None | — | — | JP | disclosed |
| US-20240317942-A1 | THIOL-CONTAINING COMPOSITION, PHOTOSETTING COMPOSITION, AND THERMOSETTING COMPOSITION | RESONAC CORPORATION (JP) | 2024-09-26 | — | — | US | disclosed |
| EP-4375302-A1 | THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION | Resonac Corporation (JP) | 2024-05-29 | — | — | EP | disclosed |
| CN-117651722-A | Thiol-containing composition, photocurable composition, and thermosetting composition | 株式会社力森诺科 | 2024-03-05 | — | — | CN | disclosed |
| CN-117466726-A | Preparation method of 4-hydroxy phenyl ketone compound | 天津久日新材料股份有限公司 | 2024-01-30 | — | — | CN | disclosed |
| WO-2023003011-A1 | THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION | 昭和電工株式会社 | 2023-01-26 | — | — | WO | disclosed |
| CN-104641295-B | Photosensitive resin composition for photospacer and photospacer | 株式会社日本触媒 | 2020-03-03 | — | — | CN | disclosed |
| US-4347111-A | PHOTOPOLYMERIZATION OF UNSATURATED COMPOUNDS, HARDENING OF PRINTING DYES | MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) | 1982-08-31 | — | — | US | disclosed |
| EP-0007468-B1 | COMPOSITIONS PHOTODURCISSABLES | CIBA-GEIGY AG (CH) | 1982-04-07 | — | — | EP | disclosed |
| US-4321118-A | Bis benzoyl sensitizers for photopolymerization or photo cross linking process and composition | CIBA-GEIGY CORPORATION (US) | 1982-03-23 | — | — | US | disclosed |
| US-4318791-A | PHOTOPOLYMERIZABLE SYSTEM FOR INKS | CIBA-GEIGY CORPORATION (US) | 1982-03-09 | — | — | US | disclosed |
| US-4315807-A | Sensitizers for photopolymerization | CIBA-GEIGY CORPORATION (US) | 1982-02-16 | — | — | US | disclosed |
| US-4308400-A | AROMATIC HYDROXY KETONES | CIBA-GEIGY A.G. (CH) | 1981-12-29 | — | — | US | disclosed |
| US-4284485-A | STABILIZED WITH A POLYALKYLPIPERIDINE DERIVATIVE | CIBA-GEIGY CORPORATION (US) | 1981-08-18 | — | — | US | disclosed |
| EP-0007468-A1 | Compositions photodurcissables | CIBA-GEIGY AG (CH) | 1980-02-06 | — | — | EP | disclosed |