Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 1/20 | 0.52 |
| ▸ | CES1 | P23141 | 1/20 | 0.52 |
| ▸ | CA1 | P00915 | 2/20 | 0.48 |
| ▸ | CA2 | P00918 | 2/20 | 0.48 |
| ▸ | GSK3B | P49841 | 2/20 | 0.45 |
| ▸ | LMNA | P02545 | 3/20 | 0.44 |
| ▸ | RAB9A | P51151 | 3/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.44 |
| ▸ | OGG1 | O15527 | 1/20 | 0.43 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.42 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.42 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.42 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.42 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.42 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11298330 | 0.88 | CA2 (0.46) | CES2CES1CA2LMNAHDAC1 | |
| SCHEMBL725519 | 0.84 | CES2 (0.54) | CES2CES1CA1CA2GSK3B | |
| SCHEMBL3050432 | 0.84 | CES2 (0.54) | CES2CES1CA1CA2GSK3B | |
| SCHEMBL11772991 | 0.84 | CES2 (0.54) | CES2CES1CA1CA2GSK3B | |
| SCHEMBL4419639 | 0.81 | ALDH1A1 (0.50) | CA2LMNAMAPTALDH1A1HTT | |
| SCHEMBL10943093 | 0.81 | CES2 (0.50) | CES2CES1CA2RAB9A | |
| SCHEMBL15251658 | 0.81 | RXRA (0.44) | CA1CA2RAB9AMAPTNPC1 | |
| SCHEMBL4656447 | 0.80 | CES2 (0.62) | CES2CES1CA1CA2GSK3B | |
| SCHEMBL10701118 | 0.79 | CA2 (0.41) | CES2CES1CA2LMNAMAPK1 | |
| SCHEMBL129749 | 0.79 | ESR1 (0.50) | CES2CA1CA2LMNAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240317942-A1 | THIOL-CONTAINING COMPOSITION, PHOTOSETTING COMPOSITION, AND THERMOSETTING COMPOSITION | RESONAC CORPORATION (JP) | 2024-09-26 | — | — | US | disclosed |
| EP-4375302-A1 | THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION | Resonac Corporation (JP) | 2024-05-29 | — | — | EP | disclosed |
| CN-117651722-A | Thiol-containing composition, photocurable composition, and thermosetting composition | 株式会社力森诺科 | 2024-03-05 | — | — | CN | disclosed |
| WO-2023003011-A1 | THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION | 昭和電工株式会社 | 2023-01-26 | — | — | WO | disclosed |
| CN-110105314-B | Method for preparing feloxicib | 江苏君若药业有限公司 | 2022-05-17 | — | — | CN | disclosed |
| CN-104641295-B | Photosensitive resin composition for photospacer and photospacer | 株式会社日本触媒 | 2020-03-03 | — | — | CN | disclosed |
| US-8772048-B2 | Fluorogenic compounds converted to fluorophores by photochemical or chemical means and their use in biological systems | KENT STATE UNIVERSITY (US) | 2014-07-08 | — | — | US | disclosed |
| US-8772048-B2 | Fluorogenic compounds converted to fluorophores by photochemical or chemical means and their use in biological systems | KENT STATE UNIVERSITY (US) | 2014-07-08 | — | — | US | disclosed |
| US-8772048-B2 | Fluorogenic compounds converted to fluorophores by photochemical or chemical means and their use in biological systems | KENT STATE UNIVERSITY (US) | 2014-07-08 | — | — | US | disclosed |
| US-8753801-B2 | Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same | FUJIFILM CORPORATION (JP) | 2014-06-17 | — | — | US | disclosed |
| WO-2006046736-A1 | THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME | SHOWA DENKO K.K. (JP) | 2006-05-04 | — | — | WO | disclosed |
| US-20060036023-A1 | Color filter black matrix resist composition | SHOWA DENKO K.K. (JP) | 2006-02-16 | — | — | US | disclosed |
| EP-1573397-A1 | COLOR FILTER BLACK MATRIX RESIST COMPOSITION | Showa Denko K.K. (JP) | 2005-09-14 | — | — | EP | disclosed |
| US-20050153231-A1 | Thiol compound, photopolymerization initiator composition and photosensitive composition | SHOWA DENKO K.K. (JP) | 2005-07-14 | — | — | US | disclosed |
| EP-1478668-A2 | THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION | Showa Denko K.K. (JP) | 2004-11-24 | — | — | EP | disclosed |
| WO-2004055596-A1 | COLOR FILTER BLACK MATRIX RESIST COMPOSITION | SHOWA DENKO K. K. (JP) | 2004-07-01 | — | — | WO | disclosed |
| WO-2003072614-A2 | THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION | SHOWA DENKO K.K. (JP) | 2003-09-04 | — | — | WO | disclosed |
| EP-1141952-A1 | UV-RADIATION-HARDENABLE BINDER COMPOSITION FOR MAGNETIC RECORDING MEDIA AND PHOTOINITIATOR MIXTURE | EMTEC Magnetics GmbH (DE) | 2001-10-10 | — | — | EP | disclosed |
| WO-2000028531-A1 | UV-RADIATION-HARDENABLE BINDER COMPOSITION FOR MAGNETIC RECORDING MEDIA AND PHOTOINITIATOR MIXTURE | EMTEC MAGNETICS GMBH (DE) | 2000-05-18 | — | — | WO | disclosed |
| EP-0446175-A2 | Mixture of photoinitiators | CIBA-GEIGY AG (CH) | 1991-09-11 | — | — | EP | disclosed |