Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.54 |
| ▸ | NAAA | Q02083 | 1/20 | 0.54 |
| ▸ | ATM | Q13315 | 1/20 | 0.50 |
| ▸ | DGKA | P23743 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 2/20 | 0.47 |
| ▸ | HPGD | P15428 | 1/20 | 0.47 |
| ▸ | RAD52 | P43351 | 1/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.45 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.45 |
| ▸ | FAAH | O00519 | 1/20 | 0.44 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.44 |
| ▸ | HTR2C | P28335 | 1/20 | 0.43 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.42 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.42 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.42 |
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3205502 | 0.93 | NAAA (0.63) | ALDH1A1NAAADGKATSHRRAD52 | |
| SCHEMBL7640502 | 0.91 | NAAA (0.67) | ALDH1A1NAAADGKATSHRRAD52 | |
| SCHEMBL31509134 | 0.91 | NAAA (0.67) | ALDH1A1NAAADGKATSHRRAD52 | |
| SCHEMBL16213825 | 0.91 | NAAA (0.67) | ALDH1A1NAAADGKATSHRRAD52 | |
| SCHEMBL8008281 | 0.91 | NAAA (0.67) | ALDH1A1NAAADGKATSHRRAD52 | |
| Dimethyl Sulfoxide SCHEMBL28107352 | 0.90 | NAAA (0.46) | ALDH1A1NAAAATMDGKATSHR | |
| Acetic Acid Butyl Ester SCHEMBL4832766 | 0.89 | ALDH1A1 (0.64) | ALDH1A1NAAAATMDGKATSHR | |
| SCHEMBL12287446 | 0.88 | NAAA (0.48) | ALDH1A1NAAADGKATSHRRAD52 | |
| SCHEMBL29075 | 0.86 | — | — | |
| SCHEMBL17582700 | 0.86 | NAAA (0.42) | ALDH1A1NAAAATMDGKATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4532 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12631965-B2 | Positive photosensitive resin composition for low-temperature process and method for preparing photoresist film | ECHEM SOLUTIONS CORP. (TW) | 2026-05-19 | — | — | US | claimed |
| CN-118131583-A | Diluent composition for removing coloring photosensitive resin | 德山新勒克斯有限公司 | 2024-06-04 | — | — | CN | claimed |
| US-20220276559-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION FOR LOW-TEMPERATURE PROCESS AND METHOD FOR PREPARING PHOTORESIST FILM | ECHEM SOLUTIONS CORP. (TW) | 2022-09-01 | — | — | US | claimed |
| US-10705424-B2 | Negative-working photoresist compositions for laser ablation and use thereof | MERCK PATENT GMBH (DE) | 2020-07-07 | — | — | US | claimed |
| CN-110511670-A | Paint composite with non-resin easy to clean preparation with heat-insulated functions and the method for preparing heat-insulated filth-resisting thin film | GUANGDONG WECAN SURFACE TECH CO LTD | 2019-11-29 | — | — | CN | claimed |
| CN-106104379-B | Photosensitive resin composition and the colored filter for using it | 三星SDI株式会社 | 2019-11-19 | — | — | CN | claimed |
| CN-110032042-A | Negative photoresist composition and its application method for laser ablation | AZ电子材料卢森堡有限公司 | 2019-07-19 | — | — | CN | claimed |
| CN-107353712-A | A kind of Thief zone type oil pastes and preparation method thereof | 上海展辰涂料有限公司 | 2017-11-17 | — | — | CN | claimed |
| CN-106104379-A | Photosensitive resin composition and color filter using same | 三星SDI株式会社 | 2016-11-09 | — | — | CN | claimed |
| CN-104610795-A | Substrate with electrically conductive coating as well as method of preparing a substrate with an electrically conductive coating | SCHOTT AG | 2015-05-13 | — | — | CN | claimed |
| CN-1716093-A | Photo-corrosion-resisting agent composition and rubbing method, organic layer pattern manufacture method, LCD without spin | SAMSUNG ELECTRONICS CO LTD (KR) | 2006-01-04 | — | — | CN | claimed |
| US-20050266339-A1 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG DISPLAY CO., LTD. (KR) | 2005-12-01 | — | — | US | claimed |
| CN-1693322-A | Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD | DONGJIN SAEMIGUNG CO LTD (KR) | 2005-11-09 | — | — | CN | claimed |
| US-6750929-B2 | Liquid crystal display device | HITACHI, LTD. (JP) | 2004-06-15 | — | — | US | claimed |
| US-20020051106-A1 | Liquid crystal display device | PANASONIC LIQUID CRYSTAL DISPLAY CO., LTD. (JP) | 2002-05-02 | — | — | US | claimed |
| EP-0948553-B1 | FRACTIONATED NOVOLAK RESIN FROM CRESOL-FORMALDEHYDE REACTION MIXTURE AND PHOTORESIST COMPOSITION THEREFROM | CLARIANT FINANCE BVI LTD (VG) | 2001-04-11 | — | — | EP | claimed |
| EP-0211667-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-03-11 | — | — | EP | claimed |
| EP-0457367-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-11-21 | — | — | EP | claimed |
| US-4945137-A | Binder combinations and a process for the production of flat materials | BAYER AKTIENGESELLSCHAFT (DE) | 1990-07-31 | — | — | US | claimed |
| EP-0211667-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-02-25 | — | — | EP | claimed |