SCHEMBL3205502

SCHEMBL3205502

CCCCCOC(=O)COC

nearest known ligand 0.63

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.63
RAD52 P43351 1/20 0.53
NPSR1 Q6W5P4 1/20 0.53
DGKA P23743 1/20 0.52
FAAH O00519 2/20 0.52
HTR2C P28335 1/20 0.50
PRSS1 P07477 1/20 0.49
PRSS2 P07478 1/20 0.49
PRSS3 P35030 1/20 0.49
EPHX1 P07099 1/20 0.48
TSHR P16473 3/20 0.47
ALDH1A1 P00352 1/20 0.46
HCAR2 Q8TDS4 2/20 0.46
CES2 O00748 1/20 0.45
TP53 P04637 1/20 0.44
CYP3A4 P08684 1/20 0.44
MAPK1 P28482 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7640502 0.98 NAAA (0.67) NAAARAD52NPSR1DGKAFAAH
SCHEMBL8008281 0.98 NAAA (0.67) NAAARAD52NPSR1DGKAFAAH
SCHEMBL31509134 0.98 NAAA (0.67) NAAARAD52NPSR1DGKAFAAH
SCHEMBL16213825 0.98 NAAA (0.67) NAAARAD52NPSR1DGKAFAAH
SCHEMBL195751 0.93 ALDH1A1 (0.54) NAAARAD52NPSR1DGKAFAAH
SCHEMBL12287446 0.91 NAAA (0.48) NAAARAD52NPSR1DGKAFAAH
Dimethyl Sulfoxide SCHEMBL28107352 0.84 NAAA (0.46) NAAARAD52NPSR1DGKAFAAH
SCHEMBL29075 0.84
SCHEMBL7651362 0.83 NAAA (0.58) NAAARAD52NPSR1DGKAFAAH
SCHEMBL7652986 0.83 NAAA (0.58) NAAARAD52NPSR1DGKAFAAH

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 135 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120118679-A Quantum dot, ink composition including the same, optical member, electronic device, and electronic apparatus 三星显示有限公司 2025-06-10 CN disclosed
CN-120118680-A Quantum dot, optical member including the same, electronic device, and electronic apparatus 三星显示有限公司 2025-06-10 CN disclosed
CN-116082298-B Oxime ester photoinitiator and photosensitive composition containing same 材料科学姑苏实验室 2025-04-25 CN disclosed
CN-112210179-B Quantum dot-containing material, method of preparing the same, and optical member and apparatus including the same 三星显示有限公司 2025-02-21 CN disclosed
US-12013644-B2 Method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-06-18 US disclosed
US-20230266666-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-08-24 US disclosed
US-20230205084-A1 RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD TOKYO OHKA KOGYO CO., LTD. (JP) 2023-06-29 US disclosed
EP-3702387-B1 PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR ETCHING GLASS SUBSTRATE TOKYO OHKA KOGYO CO LTD (JP) 2023-05-10 EP disclosed
CN-116082298-A Oxime ester photoinitiator and photosensitive composition containing same 材料科学姑苏实验室 2023-05-09 CN disclosed
US-20230125270-A1 RADIATION SENSITIVE COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2023-04-27 US disclosed
CN-1212545-C Photosensitive insulated glue composition and photosensitive film of the glue TOKYO APPLIED CHEMICAL CO LTD (JP) 2005-07-27 CN disclosed
CN-1612042-A Colouring photosensitive resin composition SUMITOMO CHEMICAL CO (JP) 2005-05-04 CN disclosed
CN-1163563-C Cyanoacrylate adhesives containing ester and polymer additives �����ɷ� 2004-08-25 CN disclosed
US-6617385-B1 Alkylene biscyanoacrylate; addition polymer; ester plasticizer HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 2003-09-09 US disclosed
US-20030148828-A1 Golf ball SUMITOMO RUBBER INDUSTRIES, LTD. (JP) 2003-08-07 US disclosed
CN-1088084-C Cyanacrylate adhesive HENKEL KGAA (DE) 2002-07-24 CN disclosed
CN-1082679-C Photosensitive resin composition for sandblast resist MATSUSHITA ELECTRIC CORP (JP) 2002-04-10 CN disclosed
CN-1280602-A Cyanoacrylate adhesives containing ester and polymer additives HENKEL KGAA (DE) 2001-01-17 CN disclosed
CN-1219949-A Cyanacrylate adhesive HENKEL KGAA (DE) 1999-06-16 CN disclosed
CN-1140843-A Photosensitive resin composition for sandblast resist MATSUSHITA ELECTRIC CORP (JP) 1997-01-22 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230266666-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN H1-0, H1-4, CHRM1 NAAA 483/4885RAD52 3498/4885NPSR1 1391/4885
US-20230125270-A1 RADIATION SENSITIVE COMPOSITION XRCC6, RAD50, XRCC5 NAAA 4800/4885RAD52 10/4885NPSR1 3656/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.