SCHEMBL195876

SCHEMBL195876

C=CC(=O)Nc1ccccc1[N+](=O)[O-]

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.63
MEN1 O00255 1/20 0.63
KCNMA1 Q12791 1/20 0.55
PHGDH O43175 1/20 0.54
TGM2 P21980 1/20 0.53
RAB9A P51151 3/20 0.52
GAA P10253 2/20 0.52
CYP2C9 P11712 2/20 0.52
CYP2C19 P33261 2/20 0.52
CYP3A4 P08684 1/20 0.52
NPSR1 Q6W5P4 1/20 0.52
NPC1 O15118 3/20 0.51
MAPT P10636 2/20 0.51
L3MBTL1 Q9Y468 1/20 0.51
PDK1 Q15118 1/20 0.51
PDK2 Q15119 1/20 0.51
PDK3 Q15120 1/20 0.51
PDK4 Q16654 1/20 0.51
RORC P51449 1/20 0.51
ALDH1A1 P00352 2/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29505642 1.00 KMT2A (0.63) KMT2AMEN1KCNMA1PHGDHTGM2
Acetonitrile SCHEMBL18764741 0.91 KMT2A (0.54) KMT2AMEN1KCNMA1PHGDHTGM2
SCHEMBL6377318 0.82 KMT2A (0.71) KMT2AMEN1KCNMA1PHGDHRAB9A
SCHEMBL5797988 0.81 KMT2A (0.69) KMT2AMEN1KCNMA1PHGDHRAB9A
SCHEMBL11754251 0.81 KMT2A (0.59) KMT2AMEN1KCNMA1PHGDHRAB9A
SCHEMBL505915 0.81 MEN1 (0.59) KMT2AMEN1KCNMA1PHGDHRAB9A
SCHEMBL9363929 0.81 ALDH1A1 (0.74) KMT2AMEN1KCNMA1RAB9AGAA
SCHEMBL505916 0.81 MEN1 (0.59) KMT2AMEN1KCNMA1PHGDHRAB9A
SCHEMBL30413407 0.81 MEN1 (0.59) KMT2AMEN1KCNMA1PHGDHRAB9A
SCHEMBL6857920 0.80 KMT2A (0.73) KMT2AMEN1KCNMA1PHGDHRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1382 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115387113-A Far infrared deodorization fabric and preparation method thereof 郑喜才 2022-11-25 CN claimed
US-6555711-B1 Reacting an N-allylimino nitrobenzene compound with a diamino-dinucleophile to form an alpha-amino-N- allylamidino-nitrobenzene compound; chemical intermediate for a pyrazolo(1,5-b)(1,2,4)triazole color photographic coupler EASTMAN KODAK COMPANY 2003-04-29 US claimed
US-6423458-B1 None US disclosed
EP-3364967-B1 FERROPORTIN INHIBITORS VIFOR INT AG (CH) 2026-05-20 EP disclosed
US-12529956-B2 Resin composition, film, optical filter, solid-state imaging element, and image display device FUJIFILM CORPORATION (JP) 2026-01-20 US disclosed
EP-3365339-B1 NOVEL FERROPORTIN INHIBITORS VIFOR INT AG (CH) 2025-07-16 EP disclosed
CN-114503029-B Photosensitive composition, cured film, color filter, light shielding film, optical element, solid-state imaging element, infrared sensor, and headlight unit 富士胶片株式会社 2025-04-22 CN disclosed
WO-2025045206-A1 PYRUVIC ACID (HETERO)ARYL THIOESTER COMPOUNDS FOR LED PHOTOPOLYMERIZATION, PREPARATION THEREFOR AND USE THEREOF 湖北固润科技股份有限公司 2025-03-06 WO disclosed
CN-112154149-B New vinylphosphines and photoinitiators obtainable therefrom 汉斯约尔格·格吕茨马赫 2025-02-21 CN disclosed
CN-115315482-B Resin composition, film, optical filter, solid-state imaging element, and image display device 富士胶片株式会社 2024-07-05 CN disclosed
CN-115504896-B Acrylic formate compound for LED photopolymerization, preparation method and application thereof 湖北固润科技股份有限公司 2024-05-07 CN disclosed
EP-0394923-A2 Photosensitive lithographic printing plate requiring no wetting water KONICA CORPORATION (JP) 1990-10-31 EP disclosed
EP-0394924-A2 Photosensitive lithographic printing plate requiring no wetting water Mitsubishi Chemical Corporation (JP) 1990-10-31 EP disclosed
US-4912013-A Containing a metal complex dye KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1990-03-27 US disclosed
EP-0353873-A1 Photsensitive composition KONICA CORPORATION (JP) 1990-02-07 EP disclosed
US-4731316-A DIAZO RESIN, OLEOPHILIC, HIGH MOLECULAR WEIGHT ACID MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) 1988-03-15 US disclosed
EP-0177962-A2 Photosensitive composition MITSUBISHI KASEI CORPORATION (JP) 1986-04-16 EP disclosed
US-4542085-A INCREASING ABSORPTION OVER SPECIFIC WAVELENGTH REGION WITH INCREASING EXPOSURE FUJI PHOTO FILM CO., LTD. (JP) 1985-09-17 US disclosed
EP-0114402-A2 Method of developing light-sensitive planographic printing plates and automatic development apparatus FUJI PHOTO FILM CO., LTD. (JP) 1984-08-01 EP disclosed
EP-0066452-A2 Photosensitive composition for photosensitive printing plate KONICA CORPORATION (JP) 1982-12-08 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12529956-B2 Resin composition, film, optical filter, solid-state imaging element, and image display device PTGER1, CD40, FPR1 KMT2A 3528/4885MEN1 3893/4885KCNMA1 2517/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.