⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14459543 | 1.00 | — | — | |
| SCHEMBL926431 | 1.00 | — | — | |
| Propylene Glycol SCHEMBL4591643 | 0.89 | TDP1 (0.40) | — | |
| SCHEMBL21777039 | 0.83 | MGAM (0.37) | — | |
| SCHEMBL31210051 | 0.83 | CA1 (0.33) | — | |
| SCHEMBL12234493 | 0.82 | TSHR (0.40) | — | |
| SCHEMBL27494399 | 0.82 | LMNA (0.44) | — | |
| SCHEMBL27494398 | 0.82 | LMNA (0.44) | — | |
| SCHEMBL13898920 | 0.82 | SMN1; SMN2 (0.42) | — | |
| SCHEMBL37035 | 0.82 | ALDH1A1 (0.46) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4053 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250388765-A1 | Water Washable Ink or Paint | CRAYOLA LLC (US) | 2025-12-25 | — | — | US | claimed |
| EP-4615891-A1 | DSA OF LIQUID CRYSTAL BLOCK COPOLYMERS FOR INTEGRATED CIRCUIT PATTERNING | Merck Patent GmbH (DE) | 2025-09-17 | — | — | EP | claimed |
| CN-110874025-B | Diluent composition, substrate processing method and semiconductor element manufacturing method | 易案爱富科技有限公司 | 2024-05-24 | — | — | CN | claimed |
| WO-2024100181-A1 | DSA OF LIQUID CRYSTAL BLOCK COPOLYMERS FOR INTEGRATED CIRCUIT PATTERNING | MERCK PATENT GMBH (DE) | 2024-05-16 | — | — | WO | claimed |
| CN-117923503-A | Hollow structure silicon dioxide dispersion liquid with aldehyde groups grafted on inner and outer surfaces and preparation method thereof | 山东国瓷功能材料股份有限公司 | 2024-04-26 | — | — | CN | claimed |
| CN-117551259-A | Epoxy resin composition, modified epoxy resin, alkali-soluble polyurethane resin composition, alkali-soluble polyurethane resin, and solder resist | 杭州福斯特电子材料有限公司 | 2024-02-13 | — | — | CN | claimed |
| US-11220659-B2 | Thinner composition | ENF TECHNOLOGY CO., LTD. (KR) | 2022-01-11 | — | — | US | claimed |
| CN-108350303-B | Novel compositions and their use for modifying the surface of substrates | 默克专利有限公司 | 2021-07-23 | — | — | CN | claimed |
| CN-105867070-B | Method for treating substrate by using thinner composition | 东友精细化工有限公司 | 2021-05-28 | — | — | CN | claimed |
| US-10705424-B2 | Negative-working photoresist compositions for laser ablation and use thereof | MERCK PATENT GMBH (DE) | 2020-07-07 | — | — | US | claimed |
| WO-2007043544-A1 | CARBOXYL GROUP-CONTAINING POLYURETHANE AND HEAT-CURABLE POLYURETHANE RESIN COMPOSITION PREPARED THEREFROM | SHOWA DENKO K.K. (JP) | 2007-04-19 | — | — | WO | claimed |
| WO-2007004738-A1 | CARBOXYL GROUP-CONTAINING POLYURETHANE AND USES THEREOF | SHOWA DENKO K.K. (JP) | 2007-01-11 | — | — | WO | claimed |
| WO-2006123804-A1 | CARBOXYL GROUP-CONTAINING POLYURETHANE, HEAT-CURABLE RESIN COMPOSITION AND USES THEREOF | SHOWA DENKO K.K. (JP) | 2006-11-23 | — | — | WO | claimed |
| US-20050260523-A1 | Photoresist composition for LCD light diffuse reflecting film | EVERLIGHT USA, INC. (US) | 2005-11-24 | — | — | US | claimed |
| CN-1700094-A | Liquid crystal display element random layer optical resistance composition | MINGDE INTERNAT WAREHOUSING & (CN) | 2005-11-23 | — | — | CN | claimed |
| CN-1693322-A | Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD | DONGJIN SAEMIGUNG CO LTD (KR) | 2005-11-09 | — | — | CN | claimed |
| EP-0948553-B1 | FRACTIONATED NOVOLAK RESIN FROM CRESOL-FORMALDEHYDE REACTION MIXTURE AND PHOTORESIST COMPOSITION THEREFROM | CLARIANT FINANCE BVI LTD (VG) | 2001-04-11 | — | — | EP | claimed |
| EP-0211667-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-03-11 | — | — | EP | claimed |
| EP-0457367-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-11-21 | — | — | EP | claimed |
| EP-0211667-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-02-25 | — | — | EP | claimed |