Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.46 |
| ▸ | LMNA | P02545 | 3/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.42 |
| ▸ | MGAM | O43451 | 1/20 | 0.42 |
| ▸ | GAA | P10253 | 1/20 | 0.42 |
| ▸ | SI | P14410 | 1/20 | 0.42 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.42 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.39 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | PIN1 | Q13526 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | CAD | P27708 | 1/20 | 0.34 |
| ▸ | MMP8 | P22894 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31460930 | 0.91 | ALDH1A1 (0.39) | ALDH1A1LMNAHSD17B10ALOX15MGAM | |
| SCHEMBL28138974 | 0.89 | ALDH1A1 (0.39) | ALDH1A1LMNAHSD17B10ALOX15MGAM | |
| Propylene Glycol SCHEMBL4591689 | 0.89 | TDP1 (0.42) | ALDH1A1LMNAHSD17B10ALOX15MGAM | |
| SCHEMBL21777039 | 0.85 | MGAM (0.37) | ALDH1A1LMNAHSD17B10ALOX15MGAM | |
| SCHEMBL29021497 | 0.84 | GAA (0.40) | ALDH1A1LMNAHSD17B10ALOX15MGAM | |
| SCHEMBL445850 | 0.83 | HCAR2 (0.38) | ALDH1A1LMNAHSD17B10ALOX15MGAM | |
| SCHEMBL3027745 | 0.83 | ALDH1A1 (0.40) | ALDH1A1LMNAHSD17B10ALOX15MGAM | |
| SCHEMBL9786483 | 0.83 | ALDH1A1 (0.40) | ALDH1A1LMNAHSD17B10ALOX15MGAM | |
| SCHEMBL196133 | 0.82 | — | — | |
| SCHEMBL926431 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 10503 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12577410-B2 | Rheology control agents for water-based resins and water-based paint compositions | KUSUMOTO CHEMICALS, LTD. (JP) | 2026-03-17 | — | — | US | claimed |
| EP-4536734-B1 | CONTINUOUS OR SEMI-CONTINUOUS PROCESS FOR PRODUCING A PRE-ACTIVATED ORGANOGELATOR PASTE | ARKEMA FRANCE (FR) | 2026-01-28 | — | — | EP | claimed |
| US-20260008931-A1 | ORGANIC POLYMER, SEMICONDUCTOR HARD MASK COMPOSITION COMPRISING SAME, AND PATTERNING METHOD USING SAME | HUNETPLUS CO LTD (KR) | 2026-01-08 | — | — | US | claimed |
| EP-4536734-A1 | CONTINUOUS OR SEMI-CONTINUOUS PROCESS FOR PRODUCING A PRE-ACTIVATED ORGANOGELATOR PASTE | ARKEMA FRANCE (FR) | 2025-04-16 | — | — | EP | claimed |
| CN-119775820-A | Environment-friendly ink for screen printing of untreated PEVA film and preparation method thereof | 上海博耳精细化学有限公司 | 2025-04-08 | — | — | CN | claimed |
| CN-118931557-B | Liquid crystal aligning agent of nitrogenous heterocyclic polysiloxane and application thereof | 波米科技有限公司 | 2025-04-01 | — | — | CN | claimed |
| CN-116144029-B | Organosilicon leveling agent, preparation method thereof, black matrix photosensitive resin composition, color filter and liquid crystal display device | 阜阳欣奕华新材料科技股份有限公司 | 2025-03-18 | — | — | CN | claimed |
| CN-119592144-A | High-weather-resistance transparent coating for radiation cooling and preparation method thereof | 天津大学 | 2025-03-11 | — | — | CN | claimed |
| CN-119504659-A | Epoxy group-containing compound and application thereof | 波米科技有限公司 | 2025-02-25 | — | — | CN | claimed |
| CN-119447311-A | Composite current collector, composite pole piece, lithium battery and preparation method | 安迈特科技(北京)有限公司 | 2025-02-14 | — | — | CN | claimed |
| WO-1999057217-A1 | ENVIRONMENTALLY PREFERRED FLUIDS AND FLUID BLENDS | EXXON CHEMICAL PATENTS INC. (US) | 1999-11-11 | — | — | WO | claimed |
| US-5919597-A | Methods for preparing photoresist compositions | IBM CORPORATION OF ARMONK (US) | 1999-07-06 | — | — | US | claimed |
| EP-0923112-A1 | DETERGENT FOR LITHOGRAPHY | Clariant International Ltd. (CH) | 1999-06-16 | — | — | EP | claimed |
| US-5368976-A | Liquid crystal display. charge coupled device | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-11-29 | — | — | US | claimed |
| US-5328871-A | Manufacturing process for semiconductor device | SHARP KABUSHIKI KAISHA (JP) | 1994-07-12 | — | — | US | claimed |
| CN-1064274-A | The pyridinesulfonamide compound or its salt, their preparation method and the weedicide that contains above-claimed cpd that replace | ISHIHARA SANGYO KAISHA (JP) | 1992-09-09 | — | — | CN | claimed |
| US-5118392-A | Introducing extractive agent to increase relative volatility | Berg, Lloyd (US) | 1992-06-02 | — | — | US | claimed |
| EP-0211667-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-03-11 | — | — | EP | claimed |
| EP-0457367-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-11-21 | — | — | EP | claimed |
| EP-0211667-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-02-25 | — | — | EP | claimed |