SCHEMBL196206

SCHEMBL196206

C=Cc1cc(C)cc(O)c1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.55
TP53 P04637 3/20 0.46
TDP1 Q9NUW8 2/20 0.46
HCAR1 Q9BXC0 1/20 0.40
LCK P06239 1/20 0.40
TRPA1 O75762 2/20 0.39
ACHE P22303 2/20 0.36
SELL P14151 1/20 0.35
SELP P16109 1/20 0.35
SELE P16581 1/20 0.35
PTPN1 P18031 1/20 0.34
KDM4E B2RXH2 3/20 0.33
LMNA P02545 3/20 0.33
CYP3A4 P08684 3/20 0.33
PTGS1 P23219 3/20 0.33
PTGS2 P35354 3/20 0.33
CA12 O43570 2/20 0.33
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
CA3 P07451 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL664775 0.82 LCK (0.58) ALDH1A1TP53TDP1LCKTRPA1
SCHEMBL181488 0.82 TP53 (0.56) ALDH1A1TP53TDP1TRPA1ACHE
SCHEMBL28683354 0.82 LCK (0.50) ALDH1A1TP53TDP1LCKTRPA1
SCHEMBL7082497 0.82 TP53 (0.56) ALDH1A1TP53TDP1TRPA1ACHE
Methoxymethane SCHEMBL28663826 0.80 TDP1 (0.50) ALDH1A1TP53TDP1TRPA1ACHE
Hydrogen Sulfide SCHEMBL29004367 0.79 TP53 (0.54) ALDH1A1TP53TDP1TRPA1ACHE
Phenol SCHEMBL27928245 0.79 TDP1 (0.50) ALDH1A1TP53TDP1TRPA1ACHE
Vinyl Ether SCHEMBL5028665 0.76 ALDH1A1 (0.62) ALDH1A1TP53TDP1HCAR1LCK
SCHEMBL29955888 0.76 ALDH1A1 (0.55) ALDH1A1TDP1HCAR1LCKACHE
SCHEMBL1619002 0.76 ALDH1A1 (0.55) ALDH1A1TDP1HCAR1LCKACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 135 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7258962-B2 Positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2007-08-21 US claimed
US-20050244747-A1 Positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2005-11-03 US claimed
US-20260147277-A1 TRANSFER FILM, PATTERN FORMING METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE FUJIFILM CORPORATION (JP) 2026-05-28 US disclosed
US-20250340695-A1 COMPOSITION, TRANSFER FILM, METHOD FOR MANUFACTURING LAMINATE, LAMINATE, AND CURED FILM FUJIFILM CORP (JP) 2025-11-06 US disclosed
US-12447725-B2 Curable resin multilayer body, dry film, cured product and electronic component TAIYO HOLDINGS CO., LTD. (JP) 2025-10-21 US disclosed
WO-2025047730-A1 TRANSFER FILM, PATTERN FORMATION METHOD, LAMINATE, SEMICONDUCTOR PACKAGE 富士フイルム株式会社 2025-03-06 WO disclosed
WO-2025028374-A1 COMPOSITION, TRANSFER FILM, METHOD FOR PRODUCING LAMINATE, LAMINATE, AND SEMICONDUCTOR PACKAGE 富士フイルム株式会社 2025-02-06 WO disclosed
WO-2025004926-A1 POLYPHENYLENE ETHER, CURABLE COMPOSITION CONTAINING POLYPHENYLENE ETHER, DRY FILM, PREPEG, CURED PRODUCT, AND ELECTRONIC COMPONENT 太陽ホールディングス株式会社 2025-01-02 WO disclosed
WO-2025004927-A1 PHENOL COMPOUND, POLYPHENYLENE ETHER, CURABLE COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND COMPOUND 太陽ホールディングス株式会社 2025-01-02 WO disclosed
WO-2024247628-A1 COMPOSITION, TRANSFER FILM, METHOD FOR PRODUCING LAMINATE, LAMINATE, AND SEMICONDUCTOR PACKAGE 富士フイルム株式会社 2024-12-05 WO disclosed
WO-2024203822-A1 TRANSFER FILM, LAMINATE PRODUCTION METHOD, AND LAMINATE 富士フイルム株式会社 2024-10-03 WO disclosed
US-20050095527-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-05 US disclosed
US-6830868-B2 Useful as a chemically amplified resist responding to active radiation, for example ultraviolet rays such as a KrF excimer laser, ArF excimer laser, and F2 excimer laser JSR CORPORATION (JP) 2004-12-14 US disclosed
US-6821705-B2 USED AS CHEMICALLY AMPLIFIED RESIST, EXHIBITS HIGH SENSITIVITY, RESOLUTION, RADIATION TRANSMITTANCE, AND SURFACE SMOOTHNESS, AND IS FREE FROM THE PROBLEM OF PARTIAL INSOLUBLIZATION DURING OVEREXPOSURE JSR CORPORATION (JP) 2004-11-23 US disclosed
US-20030194634-A1 Novel anthracene derivative and radiation-sensitive resin composition JSR CORPORATION (JP) 2003-10-16 US disclosed
EP-1343048-A2 Anthracene derivative and radiation-sensitive resin composition JSR Corporation (JP) 2003-09-10 EP disclosed
US-20030113658-A1 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition JSR CORPORATION (JP) 2003-06-19 US disclosed
EP-1270553-A2 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition JSR Corporation (JP) 2003-01-02 EP disclosed
US-20020192593-A1 Used as chemically amplified resist, exhibits high sensitivity, resolution, radiation transmittance, and surface smoothness, and is free from the problem of partial insolublization during overexposure JSR CORPORATION (JP) 2002-12-19 US disclosed
EP-1253470-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-10-30 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030194634-A1 Novel anthracene derivative and radiation-sensitive resin composition SRSF1, ARL1, ERCC4 ALDH1A1 1190/4885TP53 1685/4885TDP1 993/4885
US-20260147277-A1 TRANSFER FILM, PATTERN FORMING METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE LCP1, PCNA, FDFT1 ALDH1A1 3998/4885TP53 4269/4885TDP1 1864/4885
US-20030113658-A1 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition ASIC1, PFAS, RARA ALDH1A1 1216/4885TP53 1499/4885TDP1 2888/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.