SCHEMBL1963873

SCHEMBL1963873

CCO[Si](Cc1ccccc1Cl)(OCC)OCC

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 3/20 0.42
PNMT P11086 1/20 0.42
SLC6A2 P23975 1/20 0.42
SLC6A4 P31645 1/20 0.42
SLC6A3 Q01959 1/20 0.42
KMT2A Q03164 3/20 0.41
TAAR1 Q96RJ0 3/20 0.40
MEN1 O00255 2/20 0.40
AOC3 Q16853 1/20 0.38
ALDH1A1 P00352 1/20 0.38
CASP3 P42574 1/20 0.37
HTT P42858 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
SENP8 Q96LD8 1/20 0.37
SENP7 Q9BQF6 1/20 0.37
SENP6 Q9GZR1 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
HPGD P15428 1/20 0.37
HTR3E A5X5Y0 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8142412 0.78 TAAR1 (0.41) KMT2ATAAR1MEN1ALDH1A1SMN1; SMN2
SCHEMBL19809277 0.77 HSPA5 (0.45) IDO1TAAR1
SCHEMBL2901415 0.77 CYP4F2 (0.31) L3MBTL1MAPT
SCHEMBL6473234 0.77 ALDH1A1 (0.42) SLC6A2SLC6A4SLC6A3ALDH1A1SMN1; SMN2
SCHEMBL1971325 0.76 L3MBTL1 (0.53) KMT2AMEN1ALDH1A1TDP1L3MBTL1
SCHEMBL1974352 0.76 IDO1 (0.47) IDO1KMT2ATAAR1MEN1AOC3
SCHEMBL1970120 0.75 MAPT (0.34) ALDH1A1L3MBTL1MAPT
SCHEMBL2817172 0.74 CYP1A2 (0.46) KMT2AALDH1A1TDP1HPGDMAPT
SCHEMBL29975060 0.74 CYP1A2 (0.46) KMT2AALDH1A1TDP1HPGDMAPT
SCHEMBL2812125 0.73 ALDH1A1 (0.34) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-12 US disclosed
EP-4692941-A2 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2026-02-11 EP disclosed
CN-210289530-U Intelligent glass system of high-efficient one-way light and heat transfer 安徽伊安诺思智能科技有限公司 2020-04-10 CN disclosed
US-8871877-B2 Hybrid organic-inorganic materials that contain stabilized carbene UNIVERSITE CLAUDE BERNARD LYON 1 (UCBL) (FR) 2014-10-28 US disclosed
EP-2334430-B1 METHOD FOR PREPARING A STRUCTURED POROUS MATERIAL COMPRISING NANOPARTICLES OF METAL 0 IMBEDDED IN THE WALLS THEREOF UNIV CLAUDE BERNARD LYON (FR) 2014-02-26 EP disclosed
EP-2082804-B1 Hybrid organic-inorganic materials that contain stabilized carbene UNIV CLAUDE BERNARD LYON (FR) 2012-10-03 EP disclosed
US-20110257006-A1 METHOD FOR PREPARING A STRUCTURED POROUS MATERIAL COMPRISING NANOPARTICLES OF METAL 0 IMBEDDED IN THE WALLS THEREOF UNIVERSITE CLAUDE BERNARD LYON I (FR) 2011-10-20 US disclosed
EP-2334430-A1 METHOD FOR PREPARING A STRUCTURED POROUS MATERIAL COMPRISING NANOPARTICLES OF METAL 0 IMBEDDED IN THE WALLS THEREOF Universite Claude Bernard Lyon I (FR) 2011-06-22 EP disclosed
WO-2010040926-A1 METHOD FOR PREPARING A STRUCTURED POROUS MATERIAL COMPRISING NANOPARTICLES OF METAL 0 IMBEDDED IN THE WALLS THEREOF UNIVERSITE CLAUDE BERNARD LYON I (FR) 2010-04-15 WO disclosed
WO-2009092814-A1 HYBRID ORGANIC-INORGANIC MATERIALS THAT CONTAIN STABILIZED CARBENE CPE LYON FORMATION CONTINUE ET RECHERCHE (FR) 2009-07-30 WO disclosed
EP-2082804-A1 Hybrid organic-inorganic materials that contain stabilized carbene CPE Lyon Formation Continue et Recherche (FR) 2009-07-29 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SMC1A, SPOUT1, LBR IDO1 1945/4885PNMT 4113/4885SLC6A2 1865/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.