SCHEMBL196404

SCHEMBL196404

CCOC(=O)[C@H](CC(C)C)N(C)C

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.37
LMNA P02545 2/20 0.36
HSD17B10 Q99714 1/20 0.36
POLB P06746 1/20 0.35
MAPK1 P28482 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
GAA P10253 3/20 0.34
ALOX15 P16050 1/20 0.34
MGAM O43451 1/20 0.34
SI P14410 1/20 0.34
MGAM2 Q2M2H8 1/20 0.34
SOAT1 P35610 1/20 0.34
PTAFR P25105 1/20 0.34
CHRNB2 P17787 3/20 0.33
CHRNA4 P43681 3/20 0.33
CHRNB4 P30926 2/20 0.33
CHRNA3 P32297 2/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2C19 P33261 1/20 0.33
HTT P42858 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL196403 1.00 ALDH1A1 (0.37) ALDH1A1LMNAHSD17B10POLBMAPK1
SCHEMBL197546 0.84 CHRNB2 (0.37) ALDH1A1LMNASMN1; SMN2CHRNB2CHRNA4
SCHEMBL197545 0.84 CHRNB2 (0.37) ALDH1A1LMNASMN1; SMN2CHRNB2CHRNA4
SCHEMBL19945788 0.81 PTAFR (0.34) ALDH1A1LMNAHSD17B10POLBMAPK1
SCHEMBL19945766 0.81 PTAFR (0.34) ALDH1A1LMNAHSD17B10POLBMAPK1
SCHEMBL197128 0.81 MME (0.42) POLBSMN1; SMN2CHRNB2CHRNA4CA12
SCHEMBL197129 0.81 MME (0.42) POLBSMN1; SMN2CHRNB2CHRNA4CA12
SCHEMBL8367999 0.80 ALDH1A1 (0.42) ALDH1A1LMNAHSD17B10GAAALOX15
SCHEMBL10367281 0.79 CHRNB2 (0.33) CHRNB2CHRNA4CHRNB4CHRNA3
SCHEMBL10367282 0.79 CHRNB2 (0.33) CHRNB2CHRNA4CHRNB4CHRNA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8158330-B2 Resist protective coating composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-04-17 US disclosed
US-8088537-B2 Resist top coat composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-03 US disclosed
US-20090286182-A1 RESIST PROTECTIVE COATING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-19 US disclosed
US-20090197200-A1 Resist top coat composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-06 US disclosed