SCHEMBL197546

SCHEMBL197546

CCCOC(=O)[C@H](CC(C)C)N(C)C

nearest known ligand 0.37

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CHRNB2 P17787 7/20 0.37
CHRNA4 P43681 7/20 0.37
CHRNB4 P30926 5/20 0.37
CHRNA3 P32297 5/20 0.37
TAS1R3 Q7RTX0 2/20 0.34
TAS1R1 Q7RTX1 2/20 0.34
HCAR2 Q8TDS4 1/20 0.33
ALDH1A1 P00352 3/20 0.32
LMNA P02545 1/20 0.32
ESR1 P03372 1/20 0.31
CHRM1 P11229 1/20 0.31
TSHR P16473 1/20 0.31
SLC6A2 P23975 1/20 0.31
KDR P35968 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL197545 1.00 CHRNB2 (0.37) CHRNB2CHRNA4CHRNB4CHRNA3TAS1R3
SCHEMBL15796608 0.86 NAAA (0.46) HCAR2ALDH1A1LMNATSHR
Hydrochloric Acid SCHEMBL15569664 0.84 NAAA (0.44) HCAR2ALDH1A1LMNATSHR
SCHEMBL196404 0.84 ALDH1A1 (0.37) CHRNB2CHRNA4CHRNB4CHRNA3ALDH1A1
SCHEMBL196403 0.84 ALDH1A1 (0.37) CHRNB2CHRNA4CHRNB4CHRNA3ALDH1A1
SCHEMBL28402550 0.79 HCAR2 (0.38) TAS1R3TAS1R1HCAR2ALDH1A1LMNA
SCHEMBL197128 0.78 MME (0.42) CHRNB2CHRNA4TAS1R3TAS1R1SMN1; SMN2
SCHEMBL197129 0.78 MME (0.42) CHRNB2CHRNA4TAS1R3TAS1R1SMN1; SMN2
SCHEMBL13205138 0.77 HCAR2 (0.37) CHRNB2CHRNA4CHRNB4CHRNA3HCAR2
SCHEMBL13205137 0.77 DNM1 (0.36) CHRNB2CHRNA4CHRNB4CHRNA3HCAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8158330-B2 Resist protective coating composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-04-17 US disclosed
US-8088537-B2 Resist top coat composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-03 US disclosed
US-20090286182-A1 RESIST PROTECTIVE COATING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-19 US disclosed
US-20090197200-A1 Resist top coat composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-06 US disclosed