Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | CA12 | O43570 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1228376 | 1.00 | ACHE (0.46) | ACHEALDH1A1CA12TSHRMAPT | |
| SCHEMBL712409 | 0.89 | TSHR (0.42) | ACHEALDH1A1CA12TSHRCYP3A4 | |
| SCHEMBL29980766 | 0.88 | ACHE (0.39) | ACHEALDH1A1CA12MAPTSMN1; SMN2 | |
| SCHEMBL284469 | 0.87 | TSHR (0.41) | ACHEALDH1A1TSHRCYP3A4SMN1; SMN2 | |
| SCHEMBL1476156 | 0.87 | TSHR (0.41) | ACHEALDH1A1TSHRCYP3A4SMN1; SMN2 | |
| SCHEMBL1453562 | 0.86 | TSHR (0.43) | ACHEALDH1A1TSHRMAPK1CYP3A4 | |
| SCHEMBL1453554 | 0.86 | TSHR (0.43) | ACHEALDH1A1TSHRMAPK1CYP3A4 | |
| SCHEMBL6005448 | 0.85 | CYP1A2 (0.47) | ACHEALDH1A1TSHRMAPTMAPK1 | |
| SCHEMBL3841599 | 0.85 | TDP1 (0.44) | ACHEALDH1A1TSHRCYP3A4SMN1; SMN2 | |
| SCHEMBL283800 | 0.85 | CYP1A2 (0.47) | ACHEALDH1A1TSHRMAPTMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 861 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250334883-A1 | RESIST UNDERLAYER COMPOSITIONS, AND METHODS OF FORMING PATTERNS USING THE COMPOSITIONS | SAMSUNG SDI CO LTD (KR) | 2025-10-30 | — | — | US | claimed |
| US-20240294771-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | Tan Kah Kee Innovation Laboratory (CN) | 2024-09-05 | — | — | US | claimed |
| CN-118244576-A | Photosensitive resin composition and cured film thereof | 罗门哈斯电子材料韩国有限公司 | 2024-06-25 | — | — | CN | claimed |
| WO-2024006254-A2 | TRI-CURE HYBRID ORGANO-SILICON COATINGS | BOWLING GREEN STATE UNIVERSITY (US) | 2024-01-04 | — | — | WO | claimed |
| WO-2023070957-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | 嘉庚创新实验室 | 2023-05-04 | — | — | WO | claimed |
| CN-113913075-B | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-09-20 | — | — | CN | claimed |
| CN-113913075-A | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-01-11 | — | — | CN | claimed |
| US-11169441-B2 | Composition for forming resist underlayer film, resist underlayer film, method for forming resist pattern and method for producing semiconductor device | NISSAN CHEMICAL CORPORATION (JP) | 2021-11-09 | — | — | US | claimed |
| EP-1380895-B1 | Chemically amplified resist material | FUJITSU LTD (JP) | 2018-07-04 | — | — | EP | claimed |
| EP-2493991-B1 | ANTIREFLECTIVE COMPOSITION FOR PHOTORESISTS | MERCK PATENT GMBH (DE) | 2016-03-02 | — | — | EP | claimed |
| EP-2052293-B1 | ANTIREFLECTIVE COMPOSITION FOR PHOTORESISTS | AZ ELECTRONIC MATERIALS USA (US) | 2013-03-13 | — | — | EP | claimed |
| EP-1563343-B1 | ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS | AZ ELECTRONIC MATERIALS USA (US) | 2012-01-11 | — | — | EP | claimed |
| US-20110117501-A1 | RESIST UNDERLAYER POLYMER, RESIST UNDERLAYER COMPOSITION INCLUDING THE SAME, AND METHOD OF PATTERNING USING THE SAME | CHEIL INDUSTRIES, INC. (KR) | 2011-05-19 | — | — | US | claimed |
| EP-1131678-B1 | ANTIREFLECTIVE COMPOSITION FOR A DEEP ULTRAVIOLET PHOTORESIST | AZ ELECTRONIC MATERIALS USA (US) | 2009-07-08 | — | — | EP | claimed |
| EP-1046958-B1 | USE OF A COMPOSITION FOR BOTTOM REFLECTION PREVENTIVE FILM | AZ ELECTRONIC MATERIALS USA (US) | 2006-04-12 | — | — | EP | claimed |
| US-6488509-B1 | Plug filling for dual-damascene process | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY (TW) | 2002-12-03 | — | — | US | claimed |
| EP-0762207-B1 | Positive working photosensitive composition and method of producing relief structures | BASF AG (DE) | 2000-04-12 | — | — | EP | claimed |
| EP-0708934-B1 | RADIATION-SENSITIVE PAINT COMPOSITION | SIEMENS AG (DE) | 1998-10-21 | — | — | EP | claimed |
| US-5648195-A | Radiation-sensitive resist composition comprising a diazoketone | SIEMENS AKTIENGESELLSCHAFT (DE) | 1997-07-15 | — | — | US | claimed |
| EP-0762207-A2 | Positive working photosensitive composition and method of producing relief structures | BASF AKTIENGESELLSCHAFT (DE) | 1997-03-12 | — | — | EP | claimed |