Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | ACHE | P22303 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 3/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.38 |
| ▸ | NFKBIA | P25963 | 1/20 | 0.38 |
| ▸ | AGTR1 | P30556 | 1/20 | 0.38 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.38 |
| ▸ | RELA | Q04206 | 1/20 | 0.38 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1476156 | 1.00 | TSHR (0.41) | TSHRCYP3A4SMN1; SMN2TDP1ACHE | |
| SCHEMBL196533 | 0.87 | ACHE (0.46) | TSHRCYP3A4SMN1; SMN2ACHEMEN1 | |
| SCHEMBL1228376 | 0.87 | ACHE (0.46) | TSHRCYP3A4SMN1; SMN2ACHEMEN1 | |
| SCHEMBL1412682 | 0.86 | ALDH1A1 (0.46) | TSHRCYP3A4SMN1; SMN2TDP1MEN1 | |
| SCHEMBL712409 | 0.86 | TSHR (0.42) | TSHRCYP3A4SMN1; SMN2TDP1ACHE | |
| SCHEMBL3841599 | 0.85 | TDP1 (0.44) | TSHRCYP3A4SMN1; SMN2TDP1ACHE | |
| SCHEMBL1057141 | 0.82 | KMT2A (0.49) | TSHRMEN1KMT2AALDH1A1 | |
| SCHEMBL1057139 | 0.82 | KMT2A (0.49) | TSHRMEN1KMT2AALDH1A1 | |
| SCHEMBL1453562 | 0.81 | TSHR (0.43) | TSHRCYP3A4SMN1; SMN2ACHEMEN1 | |
| SCHEMBL1453554 | 0.81 | TSHR (0.43) | TSHRCYP3A4SMN1; SMN2ACHEMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 377 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240294771-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | Tan Kah Kee Innovation Laboratory (CN) | 2024-09-05 | — | — | US | claimed |
| CN-118244576-A | Photosensitive resin composition and cured film thereof | 罗门哈斯电子材料韩国有限公司 | 2024-06-25 | — | — | CN | claimed |
| WO-2023070957-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | 嘉庚创新实验室 | 2023-05-04 | — | — | WO | claimed |
| CN-113913075-B | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-09-20 | — | — | CN | claimed |
| CN-113913075-A | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-01-11 | — | — | CN | claimed |
| EP-1547678-B1 | Process for high-yield synthesis of nucleic acid arrays | AFFYMETRIX INC (US) | 2016-07-13 | — | — | EP | claimed |
| EP-0679951-B1 | Positive resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 1997-01-15 | — | — | EP | claimed |
| EP-0679951-A1 | Positive resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-11-02 | — | — | EP | claimed |
| US-20260140448-A1 | UNDERLAYER COMPOSITION FOR USE IN MANUFACTURING ELECTRONIC DEVICES | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-05-21 | — | — | US | disclosed |
| US-20260132241-A1 | MAIN CHAIN SCISSIONABLE BLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-05-14 | — | — | US | disclosed |
| US-20260118762-A1 | POLYMER FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | Tan Kah Kee Innovation Laboratory (CN) | 2026-04-30 | — | — | US | disclosed |
| US-20260118761-A1 | COMPOUND FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, POLYMER, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | Tan Kah Kee Innovation Laboratory (CN) | 2026-04-30 | — | — | US | disclosed |
| US-20260093176-A1 | ELECTROACTIVE COMPOUNDS, COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-04-02 | — | — | US | disclosed |
| US-20260079398-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-03-19 | — | — | US | disclosed |
| EP-0596294-A1 | Positive-working radiation-sensitive mixture and recording material produced therewith | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-05-11 | — | — | EP | disclosed |
| EP-0585980-A2 | Radiation sensitive materials and devices made therewith | AT&T Corp. (US) | 1994-03-09 | — | — | EP | disclosed |
| EP-0585980-A2 | Radiation sensitive materials and devices made therewith | AT&T Corp. (US) | 1994-03-09 | — | — | EP | disclosed |
| US-4996136-A | Radiation sensitive materials and devices made therewith | AT&T BELL LABORATORIES (US) | 1991-02-26 | — | — | US | disclosed |
| US-4996136-A | Radiation sensitive materials and devices made therewith | AT&T BELL LABORATORIES (US) | 1991-02-26 | — | — | US | disclosed |
| EP-0330386-A2 | Radiation sensitive materials and devices made therewith | AT&T Corp. (US) | 1989-08-30 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260079398-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | ARCN1, SMC4, CCT4 | TSHR 2944/4885CYP3A4 2615/4885SMN1; SMN2 3632/4885 |
| US-20260132241-A1 | MAIN CHAIN SCISSIONABLE BLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | DCLRE1A, CD79B, RAD1 | TSHR 1687/4885CYP3A4 3041/4885SMN1; SMN2 3876/4885 |
| US-20260093176-A1 | ELECTROACTIVE COMPOUNDS, COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | ETV6, KCNQ4, KCNQ1 | TSHR 4417/4885CYP3A4 3372/4885SMN1; SMN2 2718/4885 |
| US-20260118761-A1 | COMPOUND FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, POLYMER, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | RAD51, COL2A1, MRPL11 | TSHR 1838/4885CYP3A4 3384/4885SMN1; SMN2 1809/4885 |
| US-20260118762-A1 | POLYMER FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | SEC23B, SEC23IP, SEC16A | TSHR 2568/4885CYP3A4 1348/4885SMN1; SMN2 3507/4885 |
| US-20260140448-A1 | UNDERLAYER COMPOSITION FOR USE IN MANUFACTURING ELECTRONIC DEVICES | ARCN1, ASH2L, ITGB4 | TSHR 3670/4885CYP3A4 2083/4885SMN1; SMN2 3469/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.