SCHEMBL19655035

SCHEMBL19655035

C=Cc1ccc2c(c1)C(=O)c1ccc(C)cc1C2=O

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.60
MAOA P21397 3/20 0.57
MAOB P27338 3/20 0.57
TDP1 Q9NUW8 2/20 0.47
TP53 P04637 1/20 0.47
LCK P06239 1/20 0.46
CSNK2A2 P19784 1/20 0.42
CSNK2B P67870 1/20 0.42
CSNK2A1 P68400 1/20 0.42
CSNK2A3 Q8NEV1 1/20 0.42
METAP1 P53582 2/20 0.40
NQO1 P15559 2/20 0.39
POR P16435 2/20 0.39
BCL2 P10415 1/20 0.39
MCL1 Q07820 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
CA4 P22748 1/20 0.39
CA7 P43166 1/20 0.39
CA9 Q16790 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6385626 0.82 NPC1 (0.50) ELANEMAOATDP1TP53LCK
SCHEMBL182959 0.82 ELANE (0.86) ELANEMAOAMAOBTDP1LCK
SCHEMBL583153 0.82 ELANE (0.86) ELANEMAOAMAOBTDP1LCK
SCHEMBL9100646 0.81 NPC1 (0.48) ELANEMAOATDP1TP53BCL2
SCHEMBL23665423 0.80 ELANE (0.58) ELANEMAOAMAOBTDP1LCK
SCHEMBL19655043 0.78 BCL2 (0.56) MAOAMAOBTDP1LCKMETAP1
SCHEMBL19655041 0.78 ALDH1A1 (0.40) MAOAMAOBCA1CA2CA7
SCHEMBL19655042 0.78 S100A4 (0.55) MAOAMAOBMETAP1USP8USP7
SCHEMBL9946541 0.78 ESR2 (0.67) MAOAMAOBCSNK2A2CSNK2BCSNK2A1
SCHEMBL22799422 0.78 ELANE (0.78) ELANEMAOAMAOBTDP1LCK

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10377842-B2 Polymer, negative resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-08-13 US disclosed
US-10191372-B2 Polymer, positive resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-01-29 US disclosed
US-20170355795-A1 POLYMER, NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-14 US disclosed
US-20170355795-A1 POLYMER, NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-14 US disclosed
US-20170343898-A1 POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-11-30 US disclosed
US-20170343898-A1 POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-11-30 US disclosed