Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CARM1 | Q86X55 | 2/20 | 0.48 |
| ▸ | PRMT6 | Q96LA8 | 2/20 | 0.48 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.38 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.38 |
| ▸ | DRD3 | P35462 | 1/20 | 0.38 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.38 |
| ▸ | NAAA | Q02083 | 10/20 | 0.37 |
| ▸ | MAOB | P27338 | 4/20 | 0.34 |
| ▸ | HRH3 | Q9Y5N1 | 4/20 | 0.34 |
| ▸ | CTSL | P07711 | 1/20 | 0.32 |
| ▸ | CTSB | P07858 | 1/20 | 0.32 |
| ▸ | CTSK | P43235 | 1/20 | 0.32 |
| ▸ | S1PR4 | O95977 | 1/20 | 0.32 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.32 |
| ▸ | S1PR3 | Q99500 | 1/20 | 0.32 |
| ▸ | S1PR5 | Q9H228 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21657567 | 0.81 | NAAA (0.35) | NAAACTSLCTSBCTSK | |
| SCHEMBL19680376 | 0.79 | SMN1; SMN2 (0.36) | HRH3S1PR4S1PR1S1PR3S1PR5 | |
| SCHEMBL17936659 | 0.78 | SLC6A2 (0.42) | CARM1PRMT6KCNH2NAAACTSL | |
| SCHEMBL19998126 | 0.78 | NAAA (0.35) | NAAACTSLCTSBCTSK | |
| SCHEMBL10053106 | 0.76 | SMN1; SMN2 (0.34) | HRH3S1PR4S1PR1S1PR3S1PR5 | |
| SCHEMBL20109662 | 0.73 | POLB (0.34) | CARM1PRMT6NAAACTSLCTSB | |
| SCHEMBL17931665 | 0.73 | HRH3 (0.50) | MAOBHRH3 | |
| SCHEMBL10180151 | 0.70 | NPC1 (0.47) | CARM1PRMT6ADORA3CHRM1DRD3 | |
| SCHEMBL10053098 | 0.69 | ACSS2 (0.32) | S1PR4S1PR1S1PR3S1PR5 | |
| SCHEMBL10447427 | 0.66 | RIPK1 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170351176-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-12-07 | — | — | US | disclosed |