Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | NAAA | Q02083 | 9/20 | 0.33 |
| ▸ | CARM1 | Q86X55 | 1/20 | 0.32 |
| ▸ | PRMT6 | Q96LA8 | 1/20 | 0.32 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | CTSL | P07711 | 1/20 | 0.30 |
| ▸ | CTSB | P07858 | 1/20 | 0.30 |
| ▸ | CTSK | P43235 | 1/20 | 0.30 |
| ▸ | IDH1 | O75874 | 1/20 | 0.30 |
| ▸ | IDH2 | P48735 | 1/20 | 0.30 |
| ▸ | BCHE | P06276 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19901948 | 0.84 | POLB (0.37) | POLBMEN1KMT2A | |
| SCHEMBL19998126 | 0.82 | NAAA (0.35) | NAAANFE2L2MEN1KMT2ACTSL | |
| SCHEMBL21657567 | 0.82 | NAAA (0.35) | NAAANFE2L2MEN1KMT2ACTSL | |
| SCHEMBL19901949 | 0.77 | RAB9A (0.40) | POLBMEN1KMT2A | |
| SCHEMBL17936659 | 0.75 | SLC6A2 (0.42) | NAAACARM1PRMT6CTSLCTSB | |
| SCHEMBL19901945 | 0.74 | POLB (0.33) | POLBKMT2A | |
| SCHEMBL19680378 | 0.73 | CARM1 (0.48) | NAAACARM1PRMT6CTSLCTSB | |
| SCHEMBL19901978 | 0.72 | HTR3E (0.33) | — | |
| SCHEMBL19901944 | 0.71 | HTR3E (0.38) | — | |
| SCHEMBL18100897 | 0.67 | ALDH1A1 (0.46) | MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10928727-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing | FUJIFILM CORPORATION (JP) | 2021-02-23 | — | — | US | disclosed |
| US-20180120701-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2018-05-03 | — | — | US | disclosed |