SCHEMBL1968076

SCHEMBL1968076

C[CH]c1cccc2c1ccc1ccccc12

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPRT1 P00492 3/20 0.58
ALDH1A1 P00352 6/20 0.50
HSD17B10 Q99714 5/20 0.50
TDP1 Q9NUW8 2/20 0.50
CYP2A6 P11509 2/20 0.50
TSHR P16473 2/20 0.50
PAX8 Q06710 1/20 0.43
CYP1A2 P05177 4/20 0.43
HPGD P15428 4/20 0.43
HIF1A Q16665 2/20 0.43
CYP1B1 Q16678 2/20 0.43
THRB P10828 1/20 0.43
CYP3A4 P08684 3/20 0.40
MAPK1 P28482 2/20 0.40
MAPT P10636 2/20 0.40
LMNA P02545 1/20 0.40
APEX1 P27695 1/20 0.40
PMP22 Q01453 1/20 0.40
CHAT P28329 1/20 0.40
ERBB2 P04626 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL46 0.87 CHAT (0.48) ALDH1A1HSD17B10TDP1CYP2A6TSHR
SCHEMBL28083404 0.86 HSD17B10 (0.54) HPRT1ALDH1A1HSD17B10TDP1CYP2A6
SCHEMBL5478934 0.84 HPRT1 (0.54) HPRT1ALDH1A1HSD17B10TDP1CYP2A6
SCHEMBL22288140 0.83 HPRT1 (0.64) HPRT1ALDH1A1HSD17B10TDP1CYP2A6
SCHEMBL2701066 0.79 HPRT1 (0.58) HPRT1ALDH1A1HSD17B10TDP1CYP2A6
SCHEMBL7896695 0.79 HPRT1 (0.58) HPRT1ALDH1A1HSD17B10TDP1CYP2A6
SCHEMBL17384097 0.79 HPRT1 (0.58) HPRT1ALDH1A1HSD17B10TDP1CYP2A6
SCHEMBL75829 0.79 HPRT1 (0.58) HPRT1ALDH1A1HSD17B10TDP1CYP2A6
SCHEMBL1971147 0.79 HSD17B10 (0.48) HPRT1ALDH1A1HSD17B10TDP1CYP2A6
SCHEMBL548120 0.79 HPRT1 (0.58) HPRT1ALDH1A1HSD17B10TDP1CYP2A6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10640462-B2 Oil gelator NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) 2020-05-05 US disclosed
EP-3524656-A1 NOVEL HYDROGELATOR National University Corporation Shizuoka University (JP) 2019-08-14 EP disclosed
US-20190241598-A1 NOVEL HYDROGELATOR NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) 2019-08-08 US disclosed
US-10289002-B2 Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2019-05-14 US disclosed
US-20180362454-A1 OIL GELATOR NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) 2018-12-20 US disclosed
EP-3381995-A1 OIL-GELLING AGENT National University Corporation Shizuoka University (JP) 2018-10-03 EP disclosed
US-9645494-B2 Resist underlayer film forming composition containing low molecular weight dissolution accelerator NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-05-09 US disclosed
EP-2792675-B1 COMPOUND AND ASYMMETRIC SYNTHESIS REACTION MICROBIAL CHEM RES FOUND (JP) 2017-04-12 EP disclosed
US-20160363863-A1 ELECTRON BEAM RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING LACTONE-STRUCTURE-CONTAINING POLYMER NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-12-15 US disclosed
US-9514949-B2 Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-12-06 US disclosed
EP-2336256-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM WITH ONIUM GROUP Nissan Chemical Industries, Ltd. (JP) 2011-06-22 EP disclosed
US-20110143149-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2011-06-16 US disclosed
US-7842620-B2 Method for manufacturing semiconductor device using quadruple-layer laminate NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-11-30 US disclosed
US-20100291483-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING BRANCHED POLYHYDROXYSTYRENE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-11-18 US disclosed
US-20100075253-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LOW MOLECULAR WEIGHT DISSOLUTION ACCELERATOR NISSAN CHEMICAL INDUSTRIES , LTD. (JP) 2010-03-25 US disclosed
US-20100022089-A1 Method for manufacturing semiconductor device using quadruple-layer laminate NISSIAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-28 US disclosed
US-20100022092-A1 Method of producing semiconductor device using resist underlayer film by photo-crosslinking curing NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-28 US disclosed
EP-2085823-A1 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING QUADRUPLE-LAYER LAMINATE Nissan Chemical Industries, Ltd. (JP) 2009-08-05 EP disclosed
EP-2085822-A1 PROCESS FOR SEMICONDUCTOR DEVICE PRODUCTION USING UNDER-RESIST FILM CURED BY PHOTOCROSSLINKING NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) 2009-08-05 EP disclosed
US-6248918-B1 BIS(DIHYDROCARBYLPHOSPHINOYLALKYL)-1,1'-BINAPHTHOL) AND RARE EARTH OR GROUP 3A METAL SALTS NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2001-06-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20190241598-A1 NOVEL HYDROGELATOR AGL, GCK, CCNL2 HPRT1 2192/4885ALDH1A1 653/4885HSD17B10 1520/4885
US-10640462-B2 Oil gelator MGLL, CCNL2, CCNI HPRT1 1833/4885ALDH1A1 593/4885HSD17B10 204/4885
US-20110143149-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP SRR, KDM2B, MSR1 HPRT1 4713/4885ALDH1A1 3585/4885HSD17B10 2244/4885
US-20180362454-A1 OIL GELATOR MGLL, CCNL2, CCNI HPRT1 1833/4885ALDH1A1 593/4885HSD17B10 204/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.