SCHEMBL1972157

SCHEMBL1972157

C[CH]c1cc2ccccc2c2ccccc12

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRPM4 Q8TD43 1/20 0.46
ALDH1A1 P00352 5/20 0.46
HSD17B10 Q99714 4/20 0.46
HIF1A Q16665 2/20 0.46
CYP1B1 Q16678 2/20 0.46
HPRT1 P00492 3/20 0.44
MAOB P27338 1/20 0.44
CYP2A6 P11509 2/20 0.42
TSHR P16473 2/20 0.42
TDP1 Q9NUW8 1/20 0.42
CYP1A2 P05177 4/20 0.40
ERN1 O75460 1/20 0.40
HPGD P15428 3/20 0.39
MAPT P10636 2/20 0.38
POLB P06746 1/20 0.38
PKM P14618 1/20 0.38
RAD52 P43351 1/20 0.38
TAAR1 Q96RJ0 1/20 0.38
ERBB2 P04626 1/20 0.38
FYN P06241 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11798296 0.83 MAOB (0.49) TRPM4ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL11798289 0.83 MAOB (0.49) TRPM4ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL2845190 0.81 ALDH1A1 (0.50) TRPM4ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL1968076 0.78 HPRT1 (0.58) ALDH1A1HSD17B10HIF1ACYP1B1HPRT1
SCHEMBL1706394 0.78 CYP1A2 (0.57) TRPM4ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL419485 0.77 ERN1 (0.51) TRPM4ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL31180384 0.77 TRPM4 (0.46) TRPM4ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL29388348 0.77 ERN1 (0.51) TRPM4ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL1813416 0.77 TRPM4 (0.46) TRPM4ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL17227499 0.77 TRPM4 (0.46) TRPM4ALDH1A1HSD17B10HIF1ACYP1B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10640462-B2 Oil gelator NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) 2020-05-05 US disclosed
EP-3524656-A1 NOVEL HYDROGELATOR National University Corporation Shizuoka University (JP) 2019-08-14 EP disclosed
US-20190241598-A1 NOVEL HYDROGELATOR NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) 2019-08-08 US disclosed
US-10289002-B2 Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2019-05-14 US disclosed
US-20180362454-A1 OIL GELATOR NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) 2018-12-20 US disclosed
EP-3381995-A1 OIL-GELLING AGENT National University Corporation Shizuoka University (JP) 2018-10-03 EP disclosed
US-9645494-B2 Resist underlayer film forming composition containing low molecular weight dissolution accelerator NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-05-09 US disclosed
EP-2792675-B1 COMPOUND AND ASYMMETRIC SYNTHESIS REACTION MICROBIAL CHEM RES FOUND (JP) 2017-04-12 EP disclosed
US-20160363863-A1 ELECTRON BEAM RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING LACTONE-STRUCTURE-CONTAINING POLYMER NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-12-15 US disclosed
US-9514949-B2 Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-12-06 US disclosed
EP-2336256-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM WITH ONIUM GROUP Nissan Chemical Industries, Ltd. (JP) 2011-06-22 EP disclosed
US-20110143149-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2011-06-16 US disclosed
US-7842620-B2 Method for manufacturing semiconductor device using quadruple-layer laminate NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-11-30 US disclosed
US-20100291483-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING BRANCHED POLYHYDROXYSTYRENE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-11-18 US disclosed
US-20100075253-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LOW MOLECULAR WEIGHT DISSOLUTION ACCELERATOR NISSAN CHEMICAL INDUSTRIES , LTD. (JP) 2010-03-25 US disclosed
US-20100022089-A1 Method for manufacturing semiconductor device using quadruple-layer laminate NISSIAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-28 US disclosed
US-20100022092-A1 Method of producing semiconductor device using resist underlayer film by photo-crosslinking curing NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-28 US disclosed
EP-2085823-A1 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING QUADRUPLE-LAYER LAMINATE Nissan Chemical Industries, Ltd. (JP) 2009-08-05 EP disclosed
EP-2085822-A1 PROCESS FOR SEMICONDUCTOR DEVICE PRODUCTION USING UNDER-RESIST FILM CURED BY PHOTOCROSSLINKING NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) 2009-08-05 EP disclosed
US-6248918-B1 BIS(DIHYDROCARBYLPHOSPHINOYLALKYL)-1,1'-BINAPHTHOL) AND RARE EARTH OR GROUP 3A METAL SALTS NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2001-06-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20190241598-A1 NOVEL HYDROGELATOR AGL, GCK, CCNL2 TRPM4 4774/4885ALDH1A1 653/4885HSD17B10 1520/4885
US-10640462-B2 Oil gelator MGLL, CCNL2, CCNI TRPM4 4608/4885ALDH1A1 593/4885HSD17B10 204/4885
US-20110143149-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP SRR, KDM2B, MSR1 TRPM4 278/4885ALDH1A1 3585/4885HSD17B10 2244/4885
US-20180362454-A1 OIL GELATOR MGLL, CCNL2, CCNI TRPM4 4608/4885ALDH1A1 593/4885HSD17B10 204/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.