SCHEMBL1976140

SCHEMBL1976140

COc1ccc(-c2nc(CCl)nc(CCl)n2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CLK4 Q9HAZ1 1/20 0.48
▸ RAB9A P51151 6/20 0.48
▸ NPC1 O15118 6/20 0.48
▸ KDM4E B2RXH2 4/20 0.48
▸ MAPT P10636 3/20 0.48
▸ ALDH1A1 P00352 3/20 0.48
▸ JAK2 O60674 1/20 0.48
▸ POLB P06746 1/20 0.48
▸ PKM P14618 1/20 0.48
▸ TDP1 Q9NUW8 1/20 0.47
▸ TP53 P04637 2/20 0.47
▸ SMN1; SMN2 Q16637 4/20 0.45
▸ DPP4 P27487 1/20 0.43
▸ ESR1 P03372 1/20 0.43
▸ CHRNA7 P36544 1/20 0.43
▸ CYP1A1 P04798 1/20 0.43
▸ CYP1A2 P05177 1/20 0.43
▸ CYP1B1 Q16678 1/20 0.43
▸ NPSR1 Q6W5P4 1/20 0.42
▸ S1PR1 P21453 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28827825 0.83 CHRNA7 (0.57) CLK4RAB9ANPC1KDM4EMAPT
SCHEMBL28827834 0.80 CHRNA7 (0.59) CLK4RAB9ANPC1KDM4EMAPT
SCHEMBL338452 0.80 CLK4 (0.64) CLK4RAB9ANPC1KDM4EMAPT
SCHEMBL4330910 0.79 L3MBTL1 (0.51) CLK4RAB9ANPC1KDM4EMAPT
SCHEMBL2876553 0.78 CLK4 (0.61) CLK4RAB9ANPC1KDM4EMAPT
SCHEMBL15896952 0.78 CLK4 (0.61) CLK4RAB9ANPC1KDM4EMAPT
SCHEMBL28827818 0.77 HRH2 (0.51) CLK4KDM4EMAPTTP53CHRNA7
SCHEMBL7377873 0.77 ESR1 (0.55) CLK4RAB9ANPC1KDM4EMAPT
SCHEMBL8907727 0.76 NPC1 (0.52) RAB9ANPC1MAPTTP53SMN1; SMN2
SCHEMBL28827857 0.76 CASP3 (0.51) CLK4KDM4EMAPTTP53CHRNA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102591153-B Light-sensitive resin as well as preparation method and application thereof MIANYANG TRULY ELECTRONICS MFG LTD 2013-12-04 — — CN claimed
US-7183039-B2 1,4-dihydropyridine-containing IR-sensitive composition and use thereof for the production of imageable elements EASTMAN KODAK COMPANY (US) 2007-02-27 — — US claimed
US-20060154172-A1 1-4-Dihydropyridine-containing ir-sensitive composition and use thereof for the production of imageable elements KODAK REALTY INC. 2006-07-13 — — US claimed
EP-1631456-A2 1-4-DIHYDROPYRIDINE-CONTAINING IR-SENSITIVE COMPOSITION AND USE THEREOF FOR THE PRODUCTION OF IMAGEABLE ELEMENTS Kodak Polychrome Graphics GmbH (DE) 2006-03-08 — — EP claimed
WO-2005001571-A2 1-4-DIHYDROPYRIDINE-CONTAINING IR-SENSITIVE COMPOSITION AND USE THEREOF FOR THE PRODUCTION OF IMAGEABLE ELEMENTS KODAK POLYCHROME GRAPHICS GMBH (DE) 2005-01-06 — — WO claimed
CN-116981917-A Inspection tool and inspection method 富士胶片株式会社 2023-10-31 — — CN disclosed
CN-116868033-A Ultraviolet ray sensing component and ultraviolet ray sensing kit 富士胶片株式会社 2023-10-10 — — CN disclosed
CN-116868034-A Ultraviolet sensing member, microcapsule, method for producing microcapsule, dispersion for forming ultraviolet sensing layer, and ultraviolet sensing kit 富士胶片株式会社 2023-10-10 — — CN disclosed
US-8867008-B2 Blue phase liquid crystal display device LG DISPLAY CO., LTD. (KR) 2014-10-21 — — US disclosed
CN-102591153-B Light-sensitive resin as well as preparation method and application thereof MIANYANG TRULY ELECTRONICS MFG LTD 2013-12-04 — — CN disclosed
US-20110141424-A1 BLUE PHASE LIQUID CRYSTAL DISPLAY DEVICE LG DISPLAY CO., LTD. (KR) 2011-06-16 — — US disclosed
US-7625636-B2 Insulating-film forming composition, insulating film and preparation process thereof FUJIFILM CORPORATION (JP) 2009-12-01 — — US disclosed
US-20070073024-A1 dendrimer has a cage polysilsesquioxane at the core portion, and has a polymerizable group at the branched end; cured ladder polymer; mechanical strength; electronic device FUJI PHOTO FILM CO., LTD. 2007-03-29 — — US disclosed
US-5633112-A Photosensitive resin composition containing a carboxylic acid polymer, photoacid generator and secondary or tertiary aliphatic amine HITACHI, LTD. (JP) 1997-05-27 — — US disclosed
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