Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ITGB2 | P05107 | 1/20 | 0.36 |
| ▸ | ICAM1 | P05362 | 1/20 | 0.36 |
| ▸ | ITGAL | P20701 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
| ▸ | CRHBP | P24387 | 2/20 | 0.32 |
| ▸ | CRHR2 | Q13324 | 2/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.32 |
| ▸ | MAOB | P27338 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27631611 | 0.85 | HTR2A (0.33) | MAOB | |
| SCHEMBL25346478 | 0.85 | EGFR (0.33) | MAOB | |
| SCHEMBL30486608 | 0.85 | EGFR (0.33) | MAOB | |
| SCHEMBL3214016 | 0.80 | ERN1 (0.42) | LMNAMEN1KMT2A | |
| SCHEMBL23350918 | 0.80 | — | — | |
| SCHEMBL31052017 | 0.76 | DRD2 (0.49) | LMNA | |
| SCHEMBL2306687 | 0.75 | ITGB2 (0.50) | ITGB2ICAM1ITGALLMNACRHBP | |
| SCHEMBL31051863 | 0.73 | DRD2 (0.67) | — | |
| SCHEMBL25166294 | 0.71 | LMNA (0.38) | ITGB2ICAM1ITGALLMNACRHBP | |
| SCHEMBL23870266 | 0.71 | ADRA2A (0.44) | ITGB2ICAM1ITGALLMNACRHBP |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 119 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240043593-A1 | Fluorine-Containing Polymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-02-08 | — | — | US | disclosed |
| WO-2022124183-A1 | FLUORINE-CONTAINING POLYMER | セントラル硝子株式会社 | 2022-06-16 | — | — | WO | disclosed |
| US-9086628-B2 | Resist protective film-forming composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-21 | — | — | US | disclosed |
| US-8933251-B2 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-01-13 | — | — | US | disclosed |
| US-20130231491-A1 | FLUORINATED MONOMER OF CYCLIC ACETAL STRUCTURE, POLYMER, RESIST PROTECTIVE COATING COMPOSITION, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-09-05 | — | — | US | disclosed |
| US-8431323-B2 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-30 | — | — | US | disclosed |
| US-20130084517-A1 | RESIST PROTECTIVE FILM-FORMING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-04 | — | — | US | disclosed |
| US-8361703-B2 | Resist protective coating composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-29 | — | — | US | disclosed |
| US-20120313570-A1 | NONAQUEOUS ELECTROLYTE AND NONAQUEOUS ELECTROLYTE BATTERY, AND BATTERY PACK, ELECTRONIC APPLIANCE, ELECTRIC VEHICLE, ELECTRICITY STORAGE APPARATUS, AND ELECTRIC POWER SYSTEM EACH USING NONAQUEOUS ELECTROLYTE BATTERY | SONY CORPORATION (JP) | 2012-12-13 | — | — | US | disclosed |
| US-20120313570-A1 | NONAQUEOUS ELECTROLYTE AND NONAQUEOUS ELECTROLYTE BATTERY, AND BATTERY PACK, ELECTRONIC APPLIANCE, ELECTRIC VEHICLE, ELECTRICITY STORAGE APPARATUS, AND ELECTRIC POWER SYSTEM EACH USING NONAQUEOUS ELECTROLYTE BATTERY | SONY CORPORATION (JP) | 2012-12-13 | — | — | US | disclosed |
| US-20020045679-A1 | Aqueous ink composition | HITACHI MAXELL, LTD. (JP) | 2002-04-18 | — | — | US | disclosed |
| US-20020004569-A1 | Polymer, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-10 | — | — | US | disclosed |
| US-20010038969-A1 | Novel polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. OF (JP) | 2001-11-08 | — | — | US | disclosed |
| US-20010033989-A1 | Novel polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-25 | — | — | US | disclosed |
| US-20010018162-A1 | Novel polymers, chemical amplification resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1126322-A2 | Fluorine-containing polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-22 | — | — | EP | disclosed |
| EP-0359290-A1 | Aromatic diols | GLAXO GROUP LIMITED (GB) | 1990-03-21 | — | — | EP | disclosed |
| EP-0004794-B1 | SUBSTITUTED BENZAZEPINES, PROCESSES FOR PREPARING THEM AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM | SMITHKLINE BECKMAN CORPORATION (US) | 1982-04-28 | — | — | EP | disclosed |
| EP-0004794-A2 | Substituted benzazepines, processes for preparing them and pharmaceutical compositions containing them | SMITHKLINE BECKMAN CORPORATION (US) | 1979-10-17 | — | — | EP | disclosed |
| US-4171359-A | DOPAMINERGIC ACTIVITY | SMITHKLINE CORPORATION (US) | 1979-10-16 | — | — | US | disclosed |